Xu, J., Ma, Z., Li, H., Song, Y., Zhang, L., & Lu, B. (2018). A Multi-Time-Step Finite Element Algorithm for 3-D Simulation of Coupled Drift-Diffusion Reaction Process in Total Ionizing Dose Effect. IEEE transactions on semiconductor manufacturing, 31(1), 183-189. https://doi.org/10.1109/TSM.2017.2779058
Chicago-Zitierstil (17. Ausg.)Xu, Jingjie, Zhaocan Ma, Hongliang Li, Yu Song, Linbo Zhang, und Benzhuo Lu. "A Multi-Time-Step Finite Element Algorithm for 3-D Simulation of Coupled Drift-Diffusion Reaction Process in Total Ionizing Dose Effect." IEEE Transactions on Semiconductor Manufacturing 31, no. 1 (2018): 183-189. https://doi.org/10.1109/TSM.2017.2779058.
MLA-Zitierstil (9. Ausg.)Xu, Jingjie, et al. "A Multi-Time-Step Finite Element Algorithm for 3-D Simulation of Coupled Drift-Diffusion Reaction Process in Total Ionizing Dose Effect." IEEE Transactions on Semiconductor Manufacturing, vol. 31, no. 1, 2018, pp. 183-189, https://doi.org/10.1109/TSM.2017.2779058.