Energy dependence of morphologies on photoresist surfaces under Ar+ ion bombardment with normal incidence

[Display omitted] •Energy dependence of resist morphology under ion bombardment is demonstrated.•Light molecules in organic resist were enriched by ion bombardment.•Ion energy shows great potential for modulating chemistry and morphology.•Nanoholes were formed on organic resist in a wide ion energy...

Full description

Bibliographic Details

Published in:	Applied surface science Vol. 523; p. 146510
Main Authors:	Yang, Gaoyuan, Hirsch, Dietmar, Li, Jinyu, Liu, Ying, Frost, Frank, Hong, Yilin
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 01.09.2020
Subjects:	Ion bombardment Ion energy Nanoholes Nanostructures Photoresist surface ToF-SIMS Nanostructures ToF-SIMS Ion energy Photoresist surface Ion bombardment Nanoholes
ISSN:	0169-4332, 1873-5584
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!