Yang, G., Hirsch, D., Li, J., Liu, Y., Frost, F., & Hong, Y. (2020). Energy dependence of morphologies on photoresist surfaces under Ar+ ion bombardment with normal incidence. Applied surface science, 523, 146510. https://doi.org/10.1016/j.apsusc.2020.146510
Chicago-Zitierstil (17. Ausg.)Yang, Gaoyuan, Dietmar Hirsch, Jinyu Li, Ying Liu, Frank Frost, und Yilin Hong. "Energy Dependence of Morphologies on Photoresist Surfaces Under Ar+ Ion Bombardment with Normal Incidence." Applied Surface Science 523 (2020): 146510. https://doi.org/10.1016/j.apsusc.2020.146510.
MLA-Zitierstil (9. Ausg.)Yang, Gaoyuan, et al. "Energy Dependence of Morphologies on Photoresist Surfaces Under Ar+ Ion Bombardment with Normal Incidence." Applied Surface Science, vol. 523, 2020, p. 146510, https://doi.org/10.1016/j.apsusc.2020.146510.