APA (7th ed.) Citation

Wang, C., Zhou, C., Wang, J., Cho, Y., Wu, W., Wuu, D., . . . Lien, S. (2025). Deposition mechanism and photodetector application of plasma-enhanced atomic layer-deposited Ta2O5 films at various deposition temperatures. Ceramics international, 51(19), 28791-28801. https://doi.org/10.1016/j.ceramint.2025.04.088

Chicago Style (17th ed.) Citation

Wang, Chen, Chen-Hao Zhou, Jian-Gui Wang, Yun-Shao Cho, Wan-Yu Wu, Dong-Sing Wuu, Chien-Jung Huang, and Shui-Yang Lien. "Deposition Mechanism and Photodetector Application of Plasma-enhanced Atomic Layer-deposited Ta2O5 Films at Various Deposition Temperatures." Ceramics International 51, no. 19 (2025): 28791-28801. https://doi.org/10.1016/j.ceramint.2025.04.088.

MLA (9th ed.) Citation

Wang, Chen, et al. "Deposition Mechanism and Photodetector Application of Plasma-enhanced Atomic Layer-deposited Ta2O5 Films at Various Deposition Temperatures." Ceramics International, vol. 51, no. 19, 2025, pp. 28791-28801, https://doi.org/10.1016/j.ceramint.2025.04.088.