Novel Proximal Group ADMM for Placement Considering Fogging and Proximity Effects

Fogging and proximity effects (FPEs) are two major factors that cause inaccurate exposure and layout pattern distortions in e-beam lithography. In this article, we propose an analytical placement algorithm that considers both FPEs. We formulate the global placement problem as a separable minimizatio...

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Veröffentlicht in:	IEEE transactions on computer-aided design of integrated circuits and systems Jg. 41; H. 12; S. 5541 - 5553
Hauptverfasser:	Chen, Jianli, Huang, Zhipeng, Zhu, Ziran, Peng, Zheng, Zhu, Wenxing, Chang, Yao-Wen
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	New York IEEE 01.12.2022 The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Schlagworte:	Algorithms Alternating direction method analytical placement Electron beams electron-beam lithography (EBL) Fogging fogging effect Layout Lithography Mathematical analysis Optimization Placement Proximity proximity effect Proximity effects Steepest descent method
ISSN:	0278-0070, 1937-4151
Online-Zugang:	Volltext
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