Hybrid HIPIMS+MFMS power supply for dual magnetron sputtering systems

The paper presents a novel power supply device that provides a hybrid technique of dual magnetron sputtering. This power supply generates a sequence of bipolar pulses which provides both mid-frequency and high-power impulse magnetron sputtering. This allows using the advantages of both techniques, w...

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Bibliographische Detailangaben

Veröffentlicht in:	Vacuum Jg. 181; S. 109670
Hauptverfasser:	Oskirko, V.O., Zakharov, A.N., Pavlov, A.P., Solovyev, А.А., Semenov, V.A., Rabotkin, S.V.
Format:	Journal Article
Sprache:	Englisch
Veröffentlicht:	Elsevier Ltd 01.11.2020
Schlagworte:	Dual magnetron sputtering High-power impulse magnetron sputtering Mid-frequency magnetron sputtering Superimposed MF and HIPIMS High-power impulse magnetron sputtering Mid-frequency magnetron sputtering Dual magnetron sputtering Superimposed MF and HIPIMS
ISSN:	0042-207X, 1879-2715
Online-Zugang:	Volltext
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