A Metal Film Thickness Measurement System With a Large Range Based on High-Performance ME Sensors
The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations i...
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| Vydáno v: | IEEE/ASME transactions on mechatronics s. 1 - 10 |
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2025
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| ISSN: | 1083-4435, 1941-014X |
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| Abstract | The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations in lift-off distance. This article proposes a method for metal film thickness measurement across a wide range using a high-performance magnetoelectric (ME) sensor to directly detect the total magnetic field of the excitation field and the induced field. Numerical calculations based on the eddy current magnetic field model reveal a highly linear relationship within a specific range between this total magnetic field and the logarithm of the metal film thickness. If the detectable magnetic field range of the magnetic field sensor covers 32-51 nT with a bandwidth of up to 1.5 MHz, theoretically, the measurement of copper film thickness within the range of 0.65 nm-1000 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m can be achieved by adjusting the excitation magnetic field frequency, and the measurement error introduced by the lift-off distance can also be ignored. The experimentally prepared ME sensor, covering a range of 30 pT-100 nT within a bandwidth of 1.5 kHz-1.5 MHz, was used to construct a metal film thickness measurement system. Measurements on copper films with thicknesses ranging from nanometers to micrometers, under excitation fields at six different frequency excitation fields within the range of 1.5 kHz-1.5 MHz, exhibited measurement errors within 1%, confirming the feasibility of this method for a wide range of copper film thicknesses from 60 nm-350 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m. |
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| AbstractList | The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations in lift-off distance. This article proposes a method for metal film thickness measurement across a wide range using a high-performance magnetoelectric (ME) sensor to directly detect the total magnetic field of the excitation field and the induced field. Numerical calculations based on the eddy current magnetic field model reveal a highly linear relationship within a specific range between this total magnetic field and the logarithm of the metal film thickness. If the detectable magnetic field range of the magnetic field sensor covers 32-51 nT with a bandwidth of up to 1.5 MHz, theoretically, the measurement of copper film thickness within the range of 0.65 nm-1000 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m can be achieved by adjusting the excitation magnetic field frequency, and the measurement error introduced by the lift-off distance can also be ignored. The experimentally prepared ME sensor, covering a range of 30 pT-100 nT within a bandwidth of 1.5 kHz-1.5 MHz, was used to construct a metal film thickness measurement system. Measurements on copper films with thicknesses ranging from nanometers to micrometers, under excitation fields at six different frequency excitation fields within the range of 1.5 kHz-1.5 MHz, exhibited measurement errors within 1%, confirming the feasibility of this method for a wide range of copper film thicknesses from 60 nm-350 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m. |
| Author | Yu, Guoliang Zhu, Mingmin Ren, Kun Wang, Jiawei Li, Yan Zhang, Shulin Zhou, Haomiao Shi, Lingshan Qiu, Yang |
| Author_xml | – sequence: 1 givenname: Yang orcidid: 0000-0001-5148-6635 surname: Qiu fullname: Qiu, Yang organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 2 givenname: Lingshan orcidid: 0009-0009-8594-2091 surname: Shi fullname: Shi, Lingshan organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 3 givenname: Guoliang orcidid: 0000-0002-1493-8070 surname: Yu fullname: Yu, Guoliang organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 4 givenname: Mingmin orcidid: 0000-0002-1300-0937 surname: Zhu fullname: Zhu, Mingmin organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 5 givenname: Yan orcidid: 0000-0003-1809-1695 surname: Li fullname: Li, Yan organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 6 givenname: Jiawei surname: Wang fullname: Wang, Jiawei organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China – sequence: 7 givenname: Shulin orcidid: 0000-0003-1284-1010 surname: Zhang fullname: Zhang, Shulin organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China – sequence: 8 givenname: Kun orcidid: 0000-0002-2983-168X surname: Ren fullname: Ren, Kun organization: College of Integrated Circuits, Zhejiang University, Hangzhou, China – sequence: 9 givenname: Haomiao orcidid: 0000-0002-8150-5136 surname: Zhou fullname: Zhou, Haomiao organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China |
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| Snippet | The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the... |
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| SubjectTerms | Coils Eddy currents Eddy-current Frequency measurement Magnetic sensors magnetoelectric (ME) sensors Magnetoelectric effects measurement range metal thickness measurement Metals noncontact measurement Semiconductor device measurement Sensors Thickness measurement Voltage measurement |
| Title | A Metal Film Thickness Measurement System With a Large Range Based on High-Performance ME Sensors |
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