A Metal Film Thickness Measurement System With a Large Range Based on High-Performance ME Sensors

The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations i...

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Vydáno v:IEEE/ASME transactions on mechatronics s. 1 - 10
Hlavní autoři: Qiu, Yang, Shi, Lingshan, Yu, Guoliang, Zhu, Mingmin, Li, Yan, Wang, Jiawei, Zhang, Shulin, Ren, Kun, Zhou, Haomiao
Médium: Journal Article
Jazyk:angličtina
Vydáno: IEEE 2025
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ISSN:1083-4435, 1941-014X
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Abstract The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations in lift-off distance. This article proposes a method for metal film thickness measurement across a wide range using a high-performance magnetoelectric (ME) sensor to directly detect the total magnetic field of the excitation field and the induced field. Numerical calculations based on the eddy current magnetic field model reveal a highly linear relationship within a specific range between this total magnetic field and the logarithm of the metal film thickness. If the detectable magnetic field range of the magnetic field sensor covers 32-51 nT with a bandwidth of up to 1.5 MHz, theoretically, the measurement of copper film thickness within the range of 0.65 nm-1000 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m can be achieved by adjusting the excitation magnetic field frequency, and the measurement error introduced by the lift-off distance can also be ignored. The experimentally prepared ME sensor, covering a range of 30 pT-100 nT within a bandwidth of 1.5 kHz-1.5 MHz, was used to construct a metal film thickness measurement system. Measurements on copper films with thicknesses ranging from nanometers to micrometers, under excitation fields at six different frequency excitation fields within the range of 1.5 kHz-1.5 MHz, exhibited measurement errors within 1%, confirming the feasibility of this method for a wide range of copper film thicknesses from 60 nm-350 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m.
AbstractList The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the impedance or voltage of the detection coil, leading to limited measurement range and susceptibility to measurement errors caused by variations in lift-off distance. This article proposes a method for metal film thickness measurement across a wide range using a high-performance magnetoelectric (ME) sensor to directly detect the total magnetic field of the excitation field and the induced field. Numerical calculations based on the eddy current magnetic field model reveal a highly linear relationship within a specific range between this total magnetic field and the logarithm of the metal film thickness. If the detectable magnetic field range of the magnetic field sensor covers 32-51 nT with a bandwidth of up to 1.5 MHz, theoretically, the measurement of copper film thickness within the range of 0.65 nm-1000 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m can be achieved by adjusting the excitation magnetic field frequency, and the measurement error introduced by the lift-off distance can also be ignored. The experimentally prepared ME sensor, covering a range of 30 pT-100 nT within a bandwidth of 1.5 kHz-1.5 MHz, was used to construct a metal film thickness measurement system. Measurements on copper films with thicknesses ranging from nanometers to micrometers, under excitation fields at six different frequency excitation fields within the range of 1.5 kHz-1.5 MHz, exhibited measurement errors within 1%, confirming the feasibility of this method for a wide range of copper film thicknesses from 60 nm-350 <inline-formula><tex-math notation="LaTeX">\mu</tex-math></inline-formula>m.
Author Yu, Guoliang
Zhu, Mingmin
Ren, Kun
Wang, Jiawei
Li, Yan
Zhang, Shulin
Zhou, Haomiao
Shi, Lingshan
Qiu, Yang
Author_xml – sequence: 1
  givenname: Yang
  orcidid: 0000-0001-5148-6635
  surname: Qiu
  fullname: Qiu, Yang
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 2
  givenname: Lingshan
  orcidid: 0009-0009-8594-2091
  surname: Shi
  fullname: Shi, Lingshan
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 3
  givenname: Guoliang
  orcidid: 0000-0002-1493-8070
  surname: Yu
  fullname: Yu, Guoliang
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 4
  givenname: Mingmin
  orcidid: 0000-0002-1300-0937
  surname: Zhu
  fullname: Zhu, Mingmin
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 5
  givenname: Yan
  orcidid: 0000-0003-1809-1695
  surname: Li
  fullname: Li, Yan
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 6
  givenname: Jiawei
  surname: Wang
  fullname: Wang, Jiawei
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
– sequence: 7
  givenname: Shulin
  orcidid: 0000-0003-1284-1010
  surname: Zhang
  fullname: Zhang, Shulin
  organization: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, China
– sequence: 8
  givenname: Kun
  orcidid: 0000-0002-2983-168X
  surname: Ren
  fullname: Ren, Kun
  organization: College of Integrated Circuits, Zhejiang University, Hangzhou, China
– sequence: 9
  givenname: Haomiao
  orcidid: 0000-0002-8150-5136
  surname: Zhou
  fullname: Zhou, Haomiao
  organization: Key Laboratory of Electromagnetic Wave Information Technology and Metrology of Zhejiang Province, College of Information Engineering, China Jiliang University, Hangzhou, China
BookMark eNpNkMFOwkAQhjcGEwF9AeNhX6C4s7ttt0ckICYQjWD01kzLLFTp1uzWA29vEQ5e5p9M5vsP34D1XOOIsVsQIwCR3a-X08l8JIXUIxVDmmTmgvUh0xAJ0B-9bhdGRVqr-IoNQvgUQmgQ0Gc45ktqcc9n1b7m611VfjkKoTti-PFUk2v56hBaqvl71e448gX6LfFXdN18wEAb3jg-r7a76IW8bXyNriS-nPIVudD4cM0uLe4D3ZxzyN5m0_VkHi2eH58m40VUSsjayGKBiSjQFllskzgRylIMxqSplkkCGqW1Bjc6TWETF3FSdE8kMqNQSSqpUEMmT72lb0LwZPNvX9XoDzmI_Cgp_5OUHyXlZ0kddHeCKiL6BxglNYD6BfyrZT0
CODEN IATEFW
ContentType Journal Article
DBID 97E
RIA
RIE
AAYXX
CITATION
DOI 10.1109/TMECH.2024.3517698
DatabaseName IEEE Xplore (IEEE)
IEEE All-Society Periodicals Package (ASPP) 1998–Present
IEEE Electronic Library (IEL)
CrossRef
DatabaseTitle CrossRef
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library (IEL)
  url: https://ieeexplore.ieee.org/
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
EISSN 1941-014X
EndPage 10
ExternalDocumentID 10_1109_TMECH_2024_3517698
10832411
Genre orig-research
GrantInformation_xml – fundername: National Natural Science Foundation of China
  grantid: 11972333
  funderid: 10.13039/501100001809
– fundername: National Key R&D Program of China
  grantid: 2023YFF0616803
– fundername: Fundamental Research Funds for the Provincial Universities of Zhejiang
  grantid: 2022YW78
  funderid: 10.13039/100022955
– fundername: Natural Science Foundation of Zhejiang Province
  grantid: LZ23A020002
  funderid: 10.13039/501100004731
GroupedDBID -~X
0R~
29I
4.4
5GY
6IK
97E
AAJGR
AARMG
AASAJ
AAWTH
ABAZT
ABQJQ
ABVLG
ACGFS
ACIWK
ACKIV
AGQYO
AHBIQ
AKJIK
AKQYR
ALMA_UNASSIGNED_HOLDINGS
ATWAV
BEFXN
BFFAM
BGNUA
BKEBE
BPEOZ
CS3
EBS
F5P
IFIPE
IPLJI
JAVBF
LAI
M43
OCL
RIA
RIE
RNS
TN5
5VS
9M8
AAYXX
AETIX
AGSQL
AI.
AIBXA
ALLEH
CITATION
EJD
H~9
IFJZH
VH1
ID FETCH-LOGICAL-c219t-faba60bafb95f65603fe518877426614a2ff8ad4771d5b56bf65e0983a32eceb3
IEDL.DBID RIE
ISICitedReferencesCount 2
ISICitedReferencesURI http://www.webofscience.com/api/gateway?GWVersion=2&SrcApp=Summon&SrcAuth=ProQuest&DestLinkType=CitingArticles&DestApp=WOS_CPL&KeyUT=001395251500001&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
ISSN 1083-4435
IngestDate Sat Nov 29 06:33:22 EST 2025
Wed Aug 27 01:57:03 EDT 2025
IsPeerReviewed true
IsScholarly true
Language English
License https://ieeexplore.ieee.org/Xplorehelp/downloads/license-information/IEEE.html
https://doi.org/10.15223/policy-029
https://doi.org/10.15223/policy-037
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-c219t-faba60bafb95f65603fe518877426614a2ff8ad4771d5b56bf65e0983a32eceb3
ORCID 0000-0001-5148-6635
0009-0009-8594-2091
0000-0002-2983-168X
0000-0003-1809-1695
0000-0003-1284-1010
0000-0002-8150-5136
0000-0002-1493-8070
0000-0002-1300-0937
PageCount 10
ParticipantIDs crossref_primary_10_1109_TMECH_2024_3517698
ieee_primary_10832411
PublicationCentury 2000
PublicationDate 2025-00-00
PublicationDateYYYYMMDD 2025-01-01
PublicationDate_xml – year: 2025
  text: 2025-00-00
PublicationDecade 2020
PublicationTitle IEEE/ASME transactions on mechatronics
PublicationTitleAbbrev TMECH
PublicationYear 2025
Publisher IEEE
Publisher_xml – name: IEEE
SSID ssj0004101
Score 2.4464195
Snippet The majority of traditional eddy current-based metal film thickness measurement systems measure the thickness of the metal film by detecting changes in the...
SourceID crossref
ieee
SourceType Index Database
Publisher
StartPage 1
SubjectTerms Coils
Eddy currents
Eddy-current
Frequency measurement
Magnetic sensors
magnetoelectric (ME) sensors
Magnetoelectric effects
measurement range
metal thickness measurement
Metals
noncontact measurement
Semiconductor device measurement
Sensors
Thickness measurement
Voltage measurement
Title A Metal Film Thickness Measurement System With a Large Range Based on High-Performance ME Sensors
URI https://ieeexplore.ieee.org/document/10832411
WOSCitedRecordID wos001395251500001&url=https%3A%2F%2Fcvtisr.summon.serialssolutions.com%2F%23%21%2Fsearch%3Fho%3Df%26include.ft.matches%3Dt%26l%3Dnull%26q%3D
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
journalDatabaseRights – providerCode: PRVIEE
  databaseName: IEEE Electronic Library (IEL)
  customDbUrl:
  eissn: 1941-014X
  dateEnd: 99991231
  omitProxy: false
  ssIdentifier: ssj0004101
  issn: 1083-4435
  databaseCode: RIE
  dateStart: 19960101
  isFulltext: true
  titleUrlDefault: https://ieeexplore.ieee.org/
  providerName: IEEE
link http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV07T8MwELagYoCBZxHlJQ9syCUPx4nHUrXqQKsKiugW-XFRKyBBbcrvx3YCLQMDm2XdEN05vofv-w6hG665kpQrokOWEMpBkAR8IDJIGJWJx4AKN2wiHo2S6ZSPa7C6w8IAgGs-g7Zdurd8XaiVLZWZP9ycP2qRvNtxzCqw1hoE6btZx1aGUBMEfCNkPH43Gfa6A5MLBrQdRn7MePLLC22MVXFepX_wz-85RPt1-Ig7lb2P0Bbkx2hvg1TwBIkOHoIJqXF__vaOJ7O5erXXmdn8qQbiiqccv8zLGRb4wXaD40cLM8D3xqtpXOTYNoCQ8RpWgIc9_GRy3mKxbKLnfm_SHZB6kAJR5kIqSSakYJ4UmeRRZtl2wgwsEZsJ_Zx_FkGWJULTOPZ1JCMmjRB4PAlFGIAy6fYpauRFDmcIg6DayPjS2JiGKpSxCHUUaJ8xzYHSFrr9Vmz6UfFlpC7P8HjqzJBaM6S1GVqoabW6IVkp9PyP_Qu0G9j5u64Ecoka5WIFV2hHfZbz5eLanYcvbqazHw
linkProvider IEEE
linkToHtml http://cvtisr.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV07T8MwELZQQQIGnkWUpwc25JKHk9hjqVoV0VYVBNEtsuOLGgEp6oPfj-20tAwMbJZ1Q3Tn-B6-7zuEbrjiqaQ8JcoPGaEcBGHgApEeC6lkTghU2GETUb_PhkM-WIDVLRYGAGzzGdTN0r7lq3E6N6Uy_Yfr80cNknczoNRzSrjWCgbp2mnHRopQHQYsMTIOv4t7rWZHZ4MerfuBG4Wc_fJDa4NVrF9p7__ziw7Q3iKAxI3S4odoA4ojtLtGK3iMRAP3QAfVuJ2_f-B4lKdv5kLTmz_1QFwylePXfDbCAndNPzh-MkADfK_9msLjApsWEDJYAQtwr4WfddY7nkyr6KXdipsdshilQFJ9Jc1IJqQIHSkyyYPM8O34GRgqNh38WQ8tvCxjQtEoclUgg1BqIXA484XvQaoT7hNUKcYFnCIMgiot40ptZeqnvoyErwJPuWGoOFBaQ7dLxSafJWNGYjMNhyfWDIkxQ7IwQw1VjVbXJEuFnv2xf422O3Gvm3Qf-o_naMcz03htQeQCVWaTOVyirfRrlk8nV_ZsfAPvnbZm
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=A+Metal+Film+Thickness+Measurement+System+With+a+Large+Range+Based+on+High-Performance+ME+Sensors&rft.jtitle=IEEE%2FASME+transactions+on+mechatronics&rft.au=Qiu%2C+Yang&rft.au=Shi%2C+Lingshan&rft.au=Yu%2C+Guoliang&rft.au=Zhu%2C+Mingmin&rft.date=2025&rft.pub=IEEE&rft.issn=1083-4435&rft.spage=1&rft.epage=10&rft_id=info:doi/10.1109%2FTMECH.2024.3517698&rft.externalDocID=10832411
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=1083-4435&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=1083-4435&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=1083-4435&client=summon