Huang, H., Wang, C., Wang, C., Shen, F., Yang, S., Ong, J., . . . Wu, W. (2025). In Situ Atomic-Scale Investigation of Electromigration Behavior in Cu–Cu Joints at High Current Density. ACS nano, 19(33), 30211-30220. https://doi.org/10.1021/acsnano.5c07534
Citace podle Chicago (17th ed.)Huang, Hua-Jing, et al. "In Situ Atomic-Scale Investigation of Electromigration Behavior in Cu–Cu Joints at High Current Density." ACS Nano 19, no. 33 (2025): 30211-30220. https://doi.org/10.1021/acsnano.5c07534.
Citace podle MLA (9th ed.)Huang, Hua-Jing, et al. "In Situ Atomic-Scale Investigation of Electromigration Behavior in Cu–Cu Joints at High Current Density." ACS Nano, vol. 19, no. 33, 2025, pp. 30211-30220, https://doi.org/10.1021/acsnano.5c07534.
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