Metal-Catalyzed Electroless Etching of Silicon in Aerated HF/H2O Vapor for Facile Fabrication of Silicon Nanostructures

Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performe...

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Vydáno v:	Nano letters Ročník 14; číslo 8; s. 4212 - 4219
Hlavní autoři:	Hu, Ya, Peng, Kui-Qing, Qiao, Zhen, Huang, Xing, Zhang, Fu-Qiang, Sun, Rui-Nan, Meng, Xiang-Min, Lee, Shuit-Tong
Médium:	Journal Article
Jazyk:	angličtina
Vydáno:	Washington, DC American Chemical Society 13.08.2014
Témata:	Catalytic methods Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science; rheology Exact sciences and technology Low-dimensional structures (superlattices, quantum well structures, multilayers): structure, and nonelectronic properties Materials science Methods of nanofabrication Nanocrystalline materials Nanoscale materials and structures: fabrication and characterization Physics Quantum wires Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) gas phase etching electrochemistry galvanic etching Silicon nanowire Catalysts Corrosion Aqueous solutions Hafnium Etching Silicon Nanowires Nanostructures Arrays Flexibility Nanostructured materials
ISSN:	1530-6984, 1530-6992, 1530-6992
On-line přístup:	Získat plný text
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Popis
Shrnutí:	Inspired by metal corrosion in air, we demonstrate that metal-catalyzed electroless etching (MCEE) of silicon can be performed simply in aerated HF/H2O vapor for facile fabrication of three-dimensional silicon nanostructures such as silicon nanowires (SiNW) arrays. Compared to MCEE commonly performed in aqueous HF solution, the present pseudo gas phase etching offers exceptional simplicity, flexibility, environmental friendliness, and scalability for the fabrication of three-dimensional silicon nanostructures with considerable depths because of replacement of harsh oxidants such as H2O2 and AgNO3 by environmental-green and ubiquitous oxygen in air, minimum water consumption, and full utilization of HF.
Bibliografie:	ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23
ISSN:	1530-6984 1530-6992 1530-6992
DOI:	10.1021/nl500361u