AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns

Optical proximity correction (OPC) is a widely-used resolution enhancement technique (RET) for printability optimization. Recently, rigorous numerical optimization and fast machine learning are the research focus of OPC in both academia and industry, each of which complements the other in terms of r...

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Vydané v:	2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD) s. 1 - 9
Hlavní autori:	Zhao, Wenqian, Yao, Xufeng, Yu, Ziyang, Chen, Guojin, Ma, Yuzhe, Yu, Bei, Wong, Martin D.F.
Médium:	Konferenčný príspevok..
Jazyk:	English
Vydavateľské údaje:	ACM 29.10.2022
Predmet:	Industries Layout Libraries Machine learning Robustness Search problems Shape
ISSN:	1558-2434
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