Citace podle APA (7th ed.)

Zhao, W., Yao, X., Yu, Z., Chen, G., Ma, Y., Yu, B., & Wong, M. D. (2022, October 29). AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns. 2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD), 1-9. https://doi.org/10.1145/3508352.3549468

Citace podle Chicago (17th ed.)

Zhao, Wenqian, Xufeng Yao, Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu, a Martin D.F Wong. "AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns." 2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD) 29 Oct. 2022: 1-9. https://doi.org/10.1145/3508352.3549468.

Citace podle MLA (9th ed.)

Zhao, Wenqian, et al. "AdaOPC: A Self-Adaptive Mask Optimization Framework For Real Design Patterns." 2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD), 29 Oct. 2022, pp. 1-9, https://doi.org/10.1145/3508352.3549468.

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