On mask layout partitioning for electron projection lithography

Electron projection lithography (EPL) is a leading candidate for next generation lithography (NGL) in VLSI production. The membrane mask used in EPL is divided into sub-fields by struts for structural support. A layout must be partitioned into these sub-fields on mask and then stitched back together...

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Veröffentlicht in:	Digest of technical papers - IEEE/ACM International Conference on Computer-Aided Design S. 514 - 518
Hauptverfasser:	Tian, Ruiqi, Yu, Ronggang, Tang, Xiaoping, Wong, D. F.
Format:	Tagungsbericht
Sprache:	Englisch
Veröffentlicht:	New York, NY, USA ACM 10.11.2002 IEEE
Schriftenreihe:	ACM Conferences
Schlagworte:	Applied sciences Computing methodologies > Artificial intelligence > Search methodologies Computing methodologies > Artificial intelligence > Search methodologies > Discrete space search Computing methodologies > Artificial intelligence > Search methodologies > Game tree search Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Hardware > Integrated circuits > Semiconductor memory Hardware > Very large scale integration design Integrated circuits Mathematics of computing > Discrete mathematics > Graph theory > Paths and connectivity problems Microelectronic fabrication (materials and surfaces technology) Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Computation time Microelectronic fabrication Integrated circuit layout VLSI circuit Circuit design Partitioning Electron beam lithography Integrated circuit Shortest path Layout problem Computer aided design Wafer
ISBN:	0780376072, 9780780376076
ISSN:	1092-3152
Online-Zugang:	Volltext
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