APA (7th ed.) Citation

Tian, R., Yu, R., Tang, X., & Wong, D. F. (2002, November 10). On mask layout partitioning for electron projection lithography. Digest of technical papers - IEEE/ACM International Conference on Computer-Aided Design, 514-518. https://doi.org/10.1145/774572.774648

Chicago Style (17th ed.) Citation

Tian, Ruiqi, Ronggang Yu, Xiaoping Tang, and D. F. Wong. "On Mask Layout Partitioning for Electron Projection Lithography." Digest of Technical Papers - IEEE/ACM International Conference on Computer-Aided Design 10 Nov. 2002: 514-518. https://doi.org/10.1145/774572.774648.

MLA (9th ed.) Citation

Tian, Ruiqi, et al. "On Mask Layout Partitioning for Electron Projection Lithography." Digest of Technical Papers - IEEE/ACM International Conference on Computer-Aided Design, 10 Nov. 2002, pp. 514-518, https://doi.org/10.1145/774572.774648.