Yao, B., Wang, N., Zhou, J., Wang, X., Gao, H., Jiang, Z., & Guan, N. (2025, June 22). Location is Key: Leveraging LLM for Functional Bug Localization in Verilog Design. 2025 62nd ACM/IEEE Design Automation Conference (DAC), 1-7. https://doi.org/10.1109/DAC63849.2025.11133280
Citace podle Chicago (17th ed.)Yao, Bingkun, Ning Wang, Jie Zhou, Xi Wang, Hong Gao, Zhe Jiang, a Nan Guan. "Location Is Key: Leveraging LLM for Functional Bug Localization in Verilog Design." 2025 62nd ACM/IEEE Design Automation Conference (DAC) 22 Jun. 2025: 1-7. https://doi.org/10.1109/DAC63849.2025.11133280.
Citace podle MLA (9th ed.)Yao, Bingkun, et al. "Location Is Key: Leveraging LLM for Functional Bug Localization in Verilog Design." 2025 62nd ACM/IEEE Design Automation Conference (DAC), 22 Jun. 2025, pp. 1-7, https://doi.org/10.1109/DAC63849.2025.11133280.