Curvilinear Optical Proximity Correction via Cardinal Spline
This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control points, which are interconnected through cardinal splines. Mask optimization is achieved by iteratively adjusting these control points, guided...
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| Vydáno v: | 2025 62nd ACM/IEEE Design Automation Conference (DAC) s. 1 - 7 |
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22.06.2025
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| Abstract | This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control points, which are interconnected through cardinal splines. Mask optimization is achieved by iteratively adjusting these control points, guided by lithography simulation. To ensure compliance with mask rule checking (MRC) criteria, we develop comprehensive methods for checking width, space, area, and curvature. Additionally, to match the performance of inverse lithography techniques (ILT), we design algorithms to fit ILT results and resolve MRC violations. Extensive experiments demonstrate the effectiveness of our methodology, highlighting its potential as a viable OPC/ILT alternative. |
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| AbstractList | This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control points, which are interconnected through cardinal splines. Mask optimization is achieved by iteratively adjusting these control points, guided by lithography simulation. To ensure compliance with mask rule checking (MRC) criteria, we develop comprehensive methods for checking width, space, area, and curvature. Additionally, to match the performance of inverse lithography techniques (ILT), we design algorithms to fit ILT results and resolve MRC violations. Extensive experiments demonstrate the effectiveness of our methodology, highlighting its potential as a viable OPC/ILT alternative. |
| Author | Liang, Xiaoxiao Ma, Yuzhe Yu, Bei Wong, Martin Zheng, Su Yu, Ziyang |
| Author_xml | – sequence: 1 givenname: Su surname: Zheng fullname: Zheng, Su organization: Chinese University of Hong Kong – sequence: 2 givenname: Xiaoxiao surname: Liang fullname: Liang, Xiaoxiao organization: Hong Kong University of Science and Technology (GZ) – sequence: 3 givenname: Ziyang surname: Yu fullname: Yu, Ziyang organization: Chinese University of Hong Kong – sequence: 4 givenname: Yuzhe surname: Ma fullname: Ma, Yuzhe organization: Hong Kong University of Science and Technology (GZ) – sequence: 5 givenname: Bei surname: Yu fullname: Yu, Bei organization: Chinese University of Hong Kong – sequence: 6 givenname: Martin surname: Wong fullname: Wong, Martin organization: Hong Kong Baptist University |
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| Snippet | This paper presents a novel curvilinear optical proximity correction (OPC) framework. The proposed approach involves representing mask patterns with control... |
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| SubjectTerms | Adaptive optics Design automation Fitting Layout Lithography Optical interconnections Optimization Scalability Splines (mathematics) Testing |
| Title | Curvilinear Optical Proximity Correction via Cardinal Spline |
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