Search Results - "Multiscale computational fluid dynamics modeling"

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  1. 1

    Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design by Yun, Sungil, Tom, Matthew, Ou, Feiyang, Orkoulas, Gerassimos, Christofides, Panagiotis D.

    ISSN: 0098-1354
    Published: Elsevier Ltd 01.05.2022
    Published in Computers & chemical engineering (01.05.2022)
    “…•Multiscale model of thermal atomic layer etching.•Computational fluid dynamics modeling of the gas phase.•Kinetic Monte–Carlo modeling of etching…”
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    Journal Article
  2. 2

    Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design by Zhang, Yichi, Ding, Yangyao, Christofides, Panagiotis D.

    ISSN: 0263-8762, 1744-3563
    Published: Rugby Elsevier B.V 01.07.2019
    Published in Chemical engineering research & design (01.07.2019)
    “…[Display omitted] •Computational fluid dynamics modeling of ALD gas phase.•Multiscale CFD modeling of entire ALD chamber.•Numerical analysis of multiscale CFD…”
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    Journal Article
  3. 3

    Multiscale computational fluid dynamics modeling of spatial thermal atomic layer etching by Yun, Sungil, Tom, Matthew, Orkoulas, Gerassimos, Christofides, Panagiotis D.

    ISSN: 0098-1354
    Published: Elsevier Ltd 01.07.2022
    Published in Computers & chemical engineering (01.07.2022)
    “…•Multiscale model of spatial thermal atomic layer etching.•Computational fluid dynamics modeling of the gas phase.•Kinetic Monte-Carlo modeling of etching…”
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    Journal Article
  4. 4

    Multiscale computational fluid dynamics modeling and reactor design of plasma-enhanced atomic layer deposition by Zhang, Yichi, Ding, Yangyao, Christofides, Panagiotis D.

    ISSN: 0098-1354, 1873-4375
    Published: Elsevier Ltd 02.11.2020
    Published in Computers & chemical engineering (02.11.2020)
    “…Plasma-enhanced atomic layer deposition (PEALD) is one of the most widely adopted deposition methods in the semiconductor industry. It is chosen largely due to…”
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    Journal Article
  5. 5

    Multiscale Computational Fluid Dynamics Modeling for Personalized Liver Cancer Radioembolization Dosimetry by Taebi, Amirtahà, Vu, Catherine T, Roncali, Emilie

    ISSN: 1528-8951, 1528-8951
    Published: United States 01.01.2021
    Published in Journal of biomechanical engineering (01.01.2021)
    “…Yttrium-90 (90Y) radioembolization is a minimally invasive procedure increasingly used for advanced liver cancer treatment. In this method, radioactive…”
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    Journal Article
  6. 6

    Multiscale computational fluid dynamics modeling of an area-selective atomic layer deposition process using a discrete feed method by Wang, Henrik, Tom, Matthew, Ou, Feiyang, Orkoulas, Gerassimos, Christofides, Panagiotis D.

    ISSN: 2772-5081, 2772-5081
    Published: Elsevier Ltd 01.03.2024
    Published in Digital Chemical Engineering (01.03.2024)
    “… Thus, this work proposes a multiscale computational fluid dynamics modeling framework that simultaneously describes the surface chemistry and ambient fluid behavior for an Al2O3/SiO2 substrate…”
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    Journal Article
  7. 7

    Multiscale Computational Fluid Dynamics Modeling of Thermal Atomic Layer Etching: Application to Chamber Configuration Design by Tom, Matthew Cheuk-Woh

    ISBN: 9798209896494
    Published: ProQuest Dissertations & Theses 01.01.2022
    “…In recent years, increasing demand for microchips have been fueled by the rise of nano scale technologies that are difficult to fabricate. Atomic layer etching…”
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    Dissertation
  8. 8

    Integration of on-line machine learning-based endpoint control and run-to-run control for an atomic layer etching process by Wang, Henrik, Ou, Feiyang, Suherman, Julius, Orkoulas, Gerassimos, Christofides, Panagiotis D.

    ISSN: 2772-5081, 2772-5081
    Published: Elsevier Ltd 01.03.2025
    Published in Digital Chemical Engineering (01.03.2025)
    “…Control methods for Atomic Layer Etching (ALE) processes are constantly evolving due to the increasing level of precision needed to manufacture next-gen…”
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    Journal Article
  9. 9

    Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control by Zhang, Yichi

    ISBN: 9798516062063
    Published: ProQuest Dissertations & Theses 01.01.2021
    “…Facilitated by the increasing importance and demand of semiconductors for the smart phone and even the automobile industry, thermal atomic layer deposition…”
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    Dissertation
  10. 10

    Multiscale Computational Fluid Dynamics Modeling of Thermal Atomic Layer Deposition with Application to Chamber Design by Zhang, Yichi

    ISBN: 9781392268018, 139226801X
    Published: ProQuest Dissertations & Theses 01.01.2019
    “…This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry…”
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    Dissertation
  11. 11

    Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells by Crose, Marquis Grant

    ISBN: 0438078047, 9780438078048
    Published: ProQuest Dissertations & Theses 01.01.2018
    “…Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive…”
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    Dissertation
  12. 12

    Multiscale computational fluid dynamics modelling of spatial ALD on porous li-ion battery electrodes by Li, Zoushuang, Chen, Yuanxiao, Nie, Yufeng, Yang, Fan, Liu, Xiao, Gao, Yuan, Shan, Bin, Chen, Rong

    ISSN: 1385-8947, 1873-3212
    Published: Elsevier B.V 01.01.2024
    “…•A multiscale model is established to study the spatial ALD on porous electrodes.•The macro-scale CFD and pore-scale diffusion–reaction kinetics are coupled.•A…”
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    Journal Article
  13. 13

    Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films by Yun, Sungil, Tom, Matthew, Ou, Feiyang, Orkoulas, Gerassimos, Christofides, Panagiotis D.

    ISSN: 0263-8762, 1744-3563
    Published: Rugby Elsevier Ltd 01.06.2022
    Published in Chemical engineering research & design (01.06.2022)
    “…With the growing scarcity of semiconducting devices stemming from volatile prices, shortened supplies, and increased demand that are attributed to the Covid-19…”
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    Journal Article
  14. 14

    First-Principles and Multiscale Modeling for Design and Operation of Atomic Layer Processing by Yun, Sungil

    ISBN: 9798379785086
    Published: ProQuest Dissertations & Theses 01.01.2023
    “…There has been growing demand for high performance nanochips due to the Fourth Industrial Revolution. However, semiconductor manufacturing leaders are…”
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    Dissertation
  15. 15

    Economic Model Predictive Control: Handling Preventive Actuator and Sensor Maintenance and Application to Transport-Reaction Processes by Lao, Liangfeng

    ISBN: 1339096986, 9781339096988
    Published: ProQuest Dissertations & Theses 01.01.2015
    “…In chemical process industries, maintenance costs may comprise of up to 20?30% of the operating budget, and therefore, improving maintenance practices can…”
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    Dissertation