Search Results - "Multiscale computational fluid dynamics modeling"
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Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design
ISSN: 0098-1354Published: Elsevier Ltd 01.05.2022Published in Computers & chemical engineering (01.05.2022)“…•Multiscale model of thermal atomic layer etching.•Computational fluid dynamics modeling of the gas phase.•Kinetic Monte–Carlo modeling of etching…”
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Multiscale computational fluid dynamics modeling of thermal atomic layer deposition with application to chamber design
ISSN: 0263-8762, 1744-3563Published: Rugby Elsevier B.V 01.07.2019Published in Chemical engineering research & design (01.07.2019)“…[Display omitted] •Computational fluid dynamics modeling of ALD gas phase.•Multiscale CFD modeling of entire ALD chamber.•Numerical analysis of multiscale CFD…”
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Multiscale computational fluid dynamics modeling of spatial thermal atomic layer etching
ISSN: 0098-1354Published: Elsevier Ltd 01.07.2022Published in Computers & chemical engineering (01.07.2022)“…•Multiscale model of spatial thermal atomic layer etching.•Computational fluid dynamics modeling of the gas phase.•Kinetic Monte-Carlo modeling of etching…”
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Multiscale computational fluid dynamics modeling and reactor design of plasma-enhanced atomic layer deposition
ISSN: 0098-1354, 1873-4375Published: Elsevier Ltd 02.11.2020Published in Computers & chemical engineering (02.11.2020)“…Plasma-enhanced atomic layer deposition (PEALD) is one of the most widely adopted deposition methods in the semiconductor industry. It is chosen largely due to…”
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Multiscale Computational Fluid Dynamics Modeling for Personalized Liver Cancer Radioembolization Dosimetry
ISSN: 1528-8951, 1528-8951Published: United States 01.01.2021Published in Journal of biomechanical engineering (01.01.2021)“…Yttrium-90 (90Y) radioembolization is a minimally invasive procedure increasingly used for advanced liver cancer treatment. In this method, radioactive…”
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Multiscale computational fluid dynamics modeling of an area-selective atomic layer deposition process using a discrete feed method
ISSN: 2772-5081, 2772-5081Published: Elsevier Ltd 01.03.2024Published in Digital Chemical Engineering (01.03.2024)“… Thus, this work proposes a multiscale computational fluid dynamics modeling framework that simultaneously describes the surface chemistry and ambient fluid behavior for an Al2O3/SiO2 substrate…”
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Multiscale Computational Fluid Dynamics Modeling of Thermal Atomic Layer Etching: Application to Chamber Configuration Design
ISBN: 9798209896494Published: ProQuest Dissertations & Theses 01.01.2022“…In recent years, increasing demand for microchips have been fueled by the rise of nano scale technologies that are difficult to fabricate. Atomic layer etching…”
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Integration of on-line machine learning-based endpoint control and run-to-run control for an atomic layer etching process
ISSN: 2772-5081, 2772-5081Published: Elsevier Ltd 01.03.2025Published in Digital Chemical Engineering (01.03.2025)“…Control methods for Atomic Layer Etching (ALE) processes are constantly evolving due to the increasing level of precision needed to manufacture next-gen…”
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Multiscale Computational Fluid Dynamics Modeling of Thermal and Plasma Atomic Layer Deposition: Application to Chamber Design and Process Control
ISBN: 9798516062063Published: ProQuest Dissertations & Theses 01.01.2021“…Facilitated by the increasing importance and demand of semiconductors for the smart phone and even the automobile industry, thermal atomic layer deposition…”
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Multiscale Computational Fluid Dynamics Modeling of Thermal Atomic Layer Deposition with Application to Chamber Design
ISBN: 9781392268018, 139226801XPublished: ProQuest Dissertations & Theses 01.01.2019“…This work develops a first-principles-based three-dimensional, multiscale computational fluid dynamics (CFD) model, together with reactor geometry…”
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Multiscale Computational Fluid Dynamics Modeling: Parallelization and Application to Design and Control of Plasma-Enhanced Chemical Vapor Deposition of Thin Film Solar Cells
ISBN: 0438078047, 9780438078048Published: ProQuest Dissertations & Theses 01.01.2018“…Today, plasma-enhanced chemical vapor deposition (PECVD) remains the dominant processing method for the manufacture of silicon thin films due to inexpensive…”
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Multiscale computational fluid dynamics modelling of spatial ALD on porous li-ion battery electrodes
ISSN: 1385-8947, 1873-3212Published: Elsevier B.V 01.01.2024Published in Chemical engineering journal (Lausanne, Switzerland : 1996) (01.01.2024)“…•A multiscale model is established to study the spatial ALD on porous electrodes.•The macro-scale CFD and pore-scale diffusion–reaction kinetics are coupled.•A…”
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Multivariable run-to-run control of thermal atomic layer etching of aluminum oxide thin films
ISSN: 0263-8762, 1744-3563Published: Rugby Elsevier Ltd 01.06.2022Published in Chemical engineering research & design (01.06.2022)“…With the growing scarcity of semiconducting devices stemming from volatile prices, shortened supplies, and increased demand that are attributed to the Covid-19…”
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First-Principles and Multiscale Modeling for Design and Operation of Atomic Layer Processing
ISBN: 9798379785086Published: ProQuest Dissertations & Theses 01.01.2023“…There has been growing demand for high performance nanochips due to the Fourth Industrial Revolution. However, semiconductor manufacturing leaders are…”
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Economic Model Predictive Control: Handling Preventive Actuator and Sensor Maintenance and Application to Transport-Reaction Processes
ISBN: 1339096986, 9781339096988Published: ProQuest Dissertations & Theses 01.01.2015“…In chemical process industries, maintenance costs may comprise of up to 20?30% of the operating budget, and therefore, improving maintenance practices can…”
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