Výsledky vyhľadávania - "Depla, Diederik"
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On the grain size-thickness correlation for thin films
ISSN: 1359-6454, 1873-2453Vydavateľské údaje: Elsevier Ltd 15.06.2021Vydané v Acta materialia (15.06.2021)“…[Display omitted] A meta-analysis of published data in combination with measurements on Al, Cu, CuO, CoCrCuFeNi, Ni90Cr10, TiN, and V sputter deposited thin…”
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Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films
ISSN: 0925-8388, 1873-4669Vydavateľské údaje: Lausanne Elsevier B.V 05.01.2021Vydané v Journal of alloys and compounds (05.01.2021)“…The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW)1−xNx high…”
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Synthesis, crystal structures, and luminescence properties of carboxylate based rare-earth coordination polymers
ISSN: 1520-510X, 1520-510XVydavateľské údaje: United States 05.11.2012Vydané v Inorganic chemistry (05.11.2012)“…Rare-earth coordination polymers or lanthanide-organic frameworks with hitherto unreported crystal structures have been obtained on the basis of the "light"…”
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The Seebeck Coefficient of Sputter Deposited Metallic Thin Films: The Role of Process Conditions
ISSN: 2079-6412, 2079-6412Vydavateľské údaje: Basel MDPI AG 01.05.2019Vydané v Coatings (Basel) (01.05.2019)“…Because of their reduced dimensions and mass, thin film thermocouples are a promising candidate for embedded sensors in composite materials, especially for…”
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Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2}
ISSN: 1463-9084, 1463-9084Vydavateľské údaje: England 01.01.2011Vydané v Physical chemistry chemical physics : PCCP (01.01.2011)“…The water-stable metal-organic framework MIL-53(Cr) is able to adsorb phenol and p-cresol from contaminated water as well as the monomeric sugar…”
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An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment
ISSN: 0039-6028Vydavateľské údaje: Lausanne Elsevier Science 01.09.2006Vydané v Surface science (01.09.2006)“…The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001)…”
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Bio-Based Nitriles from the Heterogeneously Catalyzed Oxidative Decarboxylation of Amino Acids
ISSN: 1864-5631, 1864-564X, 1864-564XVydavateľské údaje: Weinheim WILEY-VCH Verlag 01.01.2015Vydané v ChemSusChem (01.01.2015)“…The oxidative decarboxylation of amino acids to nitriles was achieved in aqueous solution by in situ halide oxidation using catalytic amounts of tungstate…”
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The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering
ISSN: 2296-424X, 2296-424XVydavateľské údaje: Frontiers Media S.A 18.10.2017Vydané v Frontiers in physics (18.10.2017)“…The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials…”
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Sputter deposition with powder targets: An overview
ISSN: 0042-207X, 1879-2715Vydavateľské údaje: Elsevier Ltd 01.02.2021Vydané v Vacuum (01.02.2021)“…To accommodate to the current trend to study chemically more complex materials, several strategies have been developed to increase the flexibility to deposit…”
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Chemical Stability of Sputter Deposited Silver Thin Films
ISSN: 2079-6412, 2079-6412Vydavateľské údaje: Basel MDPI AG 01.12.2022Vydané v Coatings (Basel) (01.12.2022)“…Silver films with a thickness below 50 nanometer were deposited on glass using DC magnetron sputtering. The chemical stability of the films was investigated by…”
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Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers
ISSN: 1996-1944, 1996-1944Vydavateľské údaje: Basel MDPI AG 26.11.2021Vydané v Materials (26.11.2021)“…CuO and Al thin films were successively deposited using direct current (reactive) magnetron sputter deposition. A multilayer of five bilayers was deposited on…”
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Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering
ISSN: 0169-4332Vydavateľské údaje: Elsevier B.V 15.03.2023Vydané v Applied surface science (15.03.2023)“…Process curves that are obtained during reactive magnetron sputtering can exhibit a double S-shape, also termed a double hysteresis. A previous study mainly…”
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Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures
ISSN: 0040-6090, 1879-2731Vydavateľské údaje: Elsevier B.V 31.08.2021Vydané v Thin solid films (31.08.2021)“…•Reactive sputtering of nitrides based on multi-principal element alloys.•Film texture of low reactivity materials is defined by the sputtered…”
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Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W
ISSN: 0169-4332Vydavateľské údaje: Elsevier B.V 15.03.2023Vydané v Applied surface science (15.03.2023)“…[Display omitted] •A kinetic model explains and predicts residual stress evolution during deposition of sputtered and evaporated metallic thin films.•The model…”
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Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering
ISSN: 1612-8850, 1612-8869Vydavateľské údaje: Weinheim WILEY-VCH Verlag 01.06.2009Vydané v Plasma processes and polymers (01.06.2009)“…In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A…”
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Sputter deposition of copper oxide films
ISSN: 0169-4332, 1873-5584Vydavateľské údaje: Elsevier B.V 30.10.2019Vydané v Applied surface science (30.10.2019)“…Copper oxide thin films are grown by reactive magnetron sputter deposition. To define the parameter space to obtain CuO films, the influence of the oxygen…”
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PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly
ISSN: 0927-7757, 1873-4359Vydavateľské údaje: Elsevier B.V 05.01.2024Vydané v Colloids and surfaces. A, Physicochemical and engineering aspects (05.01.2024)“…Existing air-cleaning solutions more and more fail to tackle the escalating air pollution by particle manner. Here, a novel air-cleaning method is proposed…”
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On the electrical properties of sputter deposited thin films: The role of energy and impurity flux
ISSN: 0040-6090, 1879-2731Vydavateľské údaje: Elsevier B.V 30.11.2019Vydané v Thin solid films (30.11.2019)“…The energy available for an adatom diffusing on the substrate surface is an important parameter with regard to the morphological and structural properties of a…”
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Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions
ISSN: 1359-6454, 1873-2453Vydavateľské údaje: Elsevier Ltd 15.02.2023Vydané v Acta materialia (15.02.2023)“…We present a generalized multi-phase-field model to predict the growth of polycrystalline thin films fabricated by physical vapor deposition. The model…”
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Effect of processing conditions on residual stress in sputtered transition metal nitrides (TiN, ZrN and TaN): Experiments and modeling
ISSN: 0257-8972Vydavateľské údaje: 15.10.2022Vydané v Surface & coatings technology (15.10.2022)Získať plný text
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