Výsledky vyhľadávania - "Depla, Diederik"

  1. 1

    On the grain size-thickness correlation for thin films Autor Dulmaa, Altangerel, Cougnon, Florian G., Dedoncker, Robin, Depla, Diederik

    ISSN: 1359-6454, 1873-2453
    Vydavateľské údaje: Elsevier Ltd 15.06.2021
    Vydané v Acta materialia (15.06.2021)
    “…[Display omitted] A meta-analysis of published data in combination with measurements on Al, Cu, CuO, CoCrCuFeNi, Ni90Cr10, TiN, and V sputter deposited thin…”
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  2. 2

    Influence of the nitrogen content on the structure and properties of MoNbTaVW high entropy alloy thin films Autor Xia, Ao, Dedoncker, Robin, Glushko, Oleksandr, Cordill, Megan J., Depla, Diederik, Franz, Robert

    ISSN: 0925-8388, 1873-4669
    Vydavateľské údaje: Lausanne Elsevier B.V 05.01.2021
    Vydané v Journal of alloys and compounds (05.01.2021)
    “…The influence of nitrogen incorporation on the chemical composition, structure, mechanical, and electrical properties of refractory (MoNbTaVW)1−xNx high…”
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    Synthesis, crystal structures, and luminescence properties of carboxylate based rare-earth coordination polymers Autor Decadt, Roel, Van Hecke, Kristof, Depla, Diederik, Leus, Karen, Weinberger, David, Van Driessche, Isabel, Van Der Voort, Pascal, Van Deun, Rik

    ISSN: 1520-510X, 1520-510X
    Vydavateľské údaje: United States 05.11.2012
    Vydané v Inorganic chemistry (05.11.2012)
    “…Rare-earth coordination polymers or lanthanide-organic frameworks with hitherto unreported crystal structures have been obtained on the basis of the "light"…”
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  4. 4

    The Seebeck Coefficient of Sputter Deposited Metallic Thin Films: The Role of Process Conditions Autor Cougnon, Florian, Depla, Diederik

    ISSN: 2079-6412, 2079-6412
    Vydavateľské údaje: Basel MDPI AG 01.05.2019
    Vydané v Coatings (Basel) (01.05.2019)
    “…Because of their reduced dimensions and mass, thin film thermocouples are a promising candidate for embedded sensors in composite materials, especially for…”
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  5. 5

    Extracting organic contaminants from water using the metal-organic framework CrIII(OH)·{O2C-C6H4-CO2} Autor Maes, Michael, Schouteden, Stijn, Alaerts, Luc, Depla, Diederik, De Vos, Dirk E

    ISSN: 1463-9084, 1463-9084
    Vydavateľské údaje: England 01.01.2011
    “…The water-stable metal-organic framework MIL-53(Cr) is able to adsorb phenol and p-cresol from contaminated water as well as the monomeric sugar…”
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  6. 6

    An XPS study on the surface reduction of V2O5(001) induced by Ar+ ion bombardment Autor Silversmit, Geert, Depla, Diederik, Poelman, Hilde, Marin, Guy B., De Gryse, Roger

    ISSN: 0039-6028
    Vydavateľské údaje: Lausanne Elsevier Science 01.09.2006
    Vydané v Surface science (01.09.2006)
    “…The effect of the irradiation with Al Kalpha X-rays during an XPS measurement upon the surface vanadium oxidation state of a fresh in vacuum cleaved V2O5(001)…”
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  7. 7

    Bio-Based Nitriles from the Heterogeneously Catalyzed Oxidative Decarboxylation of Amino Acids Autor Claes, Laurens, Matthessen, Roman, Rombouts, Ine, Stassen, Ivo, De Baerdemaeker, Trees, Depla, Diederik, Delcour, Jan A., Lagrain, Bert, De Vos, Dirk E.

    ISSN: 1864-5631, 1864-564X, 1864-564X
    Vydavateľské údaje: Weinheim WILEY-VCH Verlag 01.01.2015
    Vydané v ChemSusChem (01.01.2015)
    “…The oxidative decarboxylation of amino acids to nitriles was achieved in aqueous solution by in situ halide oxidation using catalytic amounts of tungstate…”
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  8. 8

    The Target Material Influence on the Current Pulse during High Power Pulsed Magnetron Sputtering Autor Moens, Filip, Konstantinidis, Stéphanos, Depla, Diederik

    ISSN: 2296-424X, 2296-424X
    Vydavateľské údaje: Frontiers Media S.A 18.10.2017
    Vydané v Frontiers in physics (18.10.2017)
    “…The current-time characteristic during high power pulsed magnetron sputtering is measured under identical conditions for seventeen different target materials…”
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  9. 9

    Sputter deposition with powder targets: An overview Autor Depla, Diederik

    ISSN: 0042-207X, 1879-2715
    Vydavateľské údaje: Elsevier Ltd 01.02.2021
    Vydané v Vacuum (01.02.2021)
    “…To accommodate to the current trend to study chemically more complex materials, several strategies have been developed to increase the flexibility to deposit…”
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  10. 10

    Chemical Stability of Sputter Deposited Silver Thin Films Autor Depla, Diederik

    ISSN: 2079-6412, 2079-6412
    Vydavateľské údaje: Basel MDPI AG 01.12.2022
    Vydané v Coatings (Basel) (01.12.2022)
    “…Silver films with a thickness below 50 nanometer were deposited on glass using DC magnetron sputtering. The chemical stability of the films was investigated by…”
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  11. 11

    Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers Autor Dulmaa, Altangerel, Depla, Diederik

    ISSN: 1996-1944, 1996-1944
    Vydavateľské údaje: Basel MDPI AG 26.11.2021
    Vydané v Materials (26.11.2021)
    “…CuO and Al thin films were successively deposited using direct current (reactive) magnetron sputter deposition. A multilayer of five bilayers was deposited on…”
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  12. 12

    Influence of chemisorption on the double hysteresis phenomenon during reactive sputtering Autor Van Bever, Josja, Strijckmans, Koen, Depla, Diederik

    ISSN: 0169-4332
    Vydavateľské údaje: Elsevier B.V 15.03.2023
    Vydané v Applied surface science (15.03.2023)
    “…Process curves that are obtained during reactive magnetron sputtering can exhibit a double S-shape, also termed a double hysteresis. A previous study mainly…”
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  13. 13

    Nitride formation during reactive sputter deposition of multi-principal element alloys in argon/nitrogen mixtures Autor Depla, Diederik, Dedoncker, Robin, Strijckmans, Koen

    ISSN: 0040-6090, 1879-2731
    Vydavateľské údaje: Elsevier B.V 31.08.2021
    Vydané v Thin solid films (31.08.2021)
    “…•Reactive sputtering of nitrides based on multi-principal element alloys.•Film texture of low reactivity materials is defined by the sputtered…”
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  14. 14

    Analysis of stress in sputter-deposited films using a kinetic model for Cu, Ni, Co, Cr, Mo, W Autor Su, Tong, Rao, Zhaoxia, Berman, Sarah, Depla, Diederik, Chason, Eric

    ISSN: 0169-4332
    Vydavateľské údaje: Elsevier B.V 15.03.2023
    Vydané v Applied surface science (15.03.2023)
    “…[Display omitted] •A kinetic model explains and predicts residual stress evolution during deposition of sputtered and evaporated metallic thin films.•The model…”
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  15. 15

    Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering Autor Saraiva, Marta, Chen, Hong, Leroy, Wouter P., Mahieu, Stijn, Jehanathan, Neerushana, Lebedev, Oleg, Georgieva, Violeta, Persoons, Rosita, Depla, Diederik

    ISSN: 1612-8850, 1612-8869
    Vydavateľské údaje: Weinheim WILEY-VCH Verlag 01.06.2009
    Vydané v Plasma processes and polymers (01.06.2009)
    “…In the present work, reactive magnetron sputtering in DC mode was used to grow complex oxide thin films, starting from two separate pure metal targets. A…”
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  16. 16

    Sputter deposition of copper oxide films Autor Dulmaa, A., Vrielinck, H., Khelifi, S., Depla, Diederik

    ISSN: 0169-4332, 1873-5584
    Vydavateľské údaje: Elsevier B.V 30.10.2019
    Vydané v Applied surface science (30.10.2019)
    “…Copper oxide thin films are grown by reactive magnetron sputter deposition. To define the parameter space to obtain CuO films, the influence of the oxygen…”
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  17. 17

    PM2.5 and PM10 adsorption onto filters and surfaces functionalized with calcium carbonate particle assembly Autor Eftekhari, Karaneh, Van der Meeren, Louis, Depla, Diederik, Parakhonskiy, Bogdan, Skirtach, Andre G.

    ISSN: 0927-7757, 1873-4359
    Vydavateľské údaje: Elsevier B.V 05.01.2024
    “…Existing air-cleaning solutions more and more fail to tackle the escalating air pollution by particle manner. Here, a novel air-cleaning method is proposed…”
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  18. 18

    On the electrical properties of sputter deposited thin films: The role of energy and impurity flux Autor Cougnon, Florian G., Schramm, Isabella C., Depla, Diederik

    ISSN: 0040-6090, 1879-2731
    Vydavateľské údaje: Elsevier B.V 30.11.2019
    Vydané v Thin solid films (30.11.2019)
    “…The energy available for an adatom diffusing on the substrate surface is an important parameter with regard to the morphological and structural properties of a…”
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  19. 19

    Linking simulated polycrystalline thin film microstructures to physical vapor deposition conditions Autor Monti, Joseph M., Stewart, James A., Custer, Joyce O., Adams, David P., Depla, Diederik, Dingreville, Rémi

    ISSN: 1359-6454, 1873-2453
    Vydavateľské údaje: Elsevier Ltd 15.02.2023
    Vydané v Acta materialia (15.02.2023)
    “…We present a generalized multi-phase-field model to predict the growth of polycrystalline thin films fabricated by physical vapor deposition. The model…”
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