Process engineering analysis in semiconductor device fabrication /
Saved in:
| Main Author: | |
|---|---|
| Other Authors: | |
| Format: | Book |
| Language: | English |
| Published: |
New York :
McGraw-Hill,
1993
|
| Edition: | [1st ed.] |
| Series: | Chemical engineering series
|
| Subjects: | |
| ISBN: | 0070418535 |
| Online Access: |
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
MARC
| LEADER | 00000nam a2200000 4500 | ||
|---|---|---|---|
| 003 | SK-BrCVT | ||
| 005 | 20220617184925.0 | ||
| 008 | 001102s1993 xxu e ||||||eng d | ||
| 020 | |a 0070418535 | ||
| 035 | |a CVTIDW0939180 | ||
| 040 | |b slo |a CVTI SR | ||
| 041 | 0 | |a eng | |
| 044 | |a xxu | ||
| 080 | |a 621.315.592 |2 UDC-MRF | ||
| 080 | |a 621.382 |2 UDC-MRF | ||
| 100 | 1 | |a Middleman, Stanley | |
| 242 | 1 | 0 | |a Analýza technologických procesov vo výrobe polovodičových prístrojov |
| 245 | 1 | 0 | |a Process engineering analysis in semiconductor device fabrication / |c Stanley Middleman, Arthur K. Hochberg |
| 250 | |a [1st ed.] | ||
| 260 | |a New York : |b McGraw-Hill, |c 1993 | ||
| 300 | |a XVII, 774 s. : |b grafy, lit., obr., tab. ; | ||
| 490 | 0 | |a Chemical engineering series | |
| 653 | 1 | |a tranzistor |a čistota výrobného prostredia |a filtrácia |a silikón |a čistá chemikália |a pokovovanie |a leptanie |a dotovanie | |
| 692 | |a GM ML PO MM | ||
| 700 | 1 | |a Hochberg, Arthur K. | |
| 760 | 1 | |t Chemical engineering series | |
| 910 | |b A555212 | ||
| 919 | |a 0-07-041853-5 | ||
| 974 | |f Knihy | ||
| 992 | |a AMG | ||
| 999 | |c 86245 |d 86245 | ||

