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Chemical vapour deposition of Tungsten from WF6/SiH4 and WF6/GeH4 /

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Bibliographic Details
Main Author:	Jeugd, Cornelius Alexander van der
Format:	Thesis Book
Language:	English
Published:	Delft : Technická univerzita, 1992
Edition:	1st ed.
Subjects:	metalizácia integrovaných obvodov > reaktor > termodynamika > kinetika pokovovania
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