Chemical vapour deposition of Tungsten from WF6/SiH4 and WF6/GeH4 /
Saved in:
| Main Author: | |
|---|---|
| Format: | Thesis Book |
| Language: | English |
| Published: |
Delft :
Technická univerzita,
1992
|
| Edition: | 1st ed. |
| Subjects: | |
| Online Access: |
|
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
MARC
| LEADER | 00000nam a2200000 4500 | ||
|---|---|---|---|
| 003 | SK-BrCVT | ||
| 005 | 20220617155939.0 | ||
| 008 | 930120s1992 ne e ||||||eng d | ||
| 035 | |a CVTIDW0906710 | ||
| 040 | |b slo |a CVTI SR |e AACR2 | ||
| 041 | 0 | |a eng | |
| 044 | |a ne | ||
| 080 | |a 621.793:669.277(043.3) |2 UDC-MRF | ||
| 100 | 1 | |a Jeugd, Cornelius Alexander van der | |
| 242 | 1 | 0 | |a Chemické pokovovanie zrážaním kovových pár wolfrámu z WF6/SiH4 a WF6/GeH4 |
| 245 | 1 | 0 | |a Chemical vapour deposition of Tungsten from WF6/SiH4 and WF6/GeH4 / |c Cornelius Alexander van der Jeugd |
| 250 | |a 1st ed. | ||
| 260 | |a Delft : |b Technická univerzita, |c 1992 | ||
| 300 | |a X, 112 s. : |b fotogr., grafy, lit., obr., tab. ; | ||
| 502 | |d 19. 5. 1992 | ||
| 653 | 1 | |a metalizácia integrovaných obvodov |a reaktor |a termodynamika |a kinetika pokovovania | |
| 692 | |a HA VD PR PO MM | ||
| 910 | |b A533841 | ||
| 974 | |f Knihy | ||
| 992 | |a DDZ | ||
| 999 | |c 55708 |d 55708 | ||