Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

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Hlavní autor: Shim, Seongbo (Autor)
Médium: Elektronický zdroj E-kniha
Jazyk:angličtina
Vydáno: Cham : Springer International Publishing, 2018.
Vydání:1st ed. 2018.
Edice:NanoScience and Technology,
Témata:
Nanotechnology.
Electronic circuits.
Optical materials.
Electronic materials.
Nanoscale science.
Nanoscience.
Nanostructures.
Semiconductors.
ISBN:9783319762944
ISSN:1434-4904
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Obsah:
  • Introduction
  • DSAL Manufacturability
  • Placement Optimization for DSAL
  • Placement Optimization for MP-DSAL Compliant Layout
  • Redundant Via Insertion for DSAL.

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