Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...
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| Hlavní autor: | |
|---|---|
| Médium: | Elektronický zdroj E-kniha |
| Jazyk: | angličtina |
| Vydáno: |
Cham :
Springer International Publishing,
2018.
|
| Vydání: | 1st ed. 2018. |
| Edice: | NanoScience and Technology,
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| Témata: | |
| ISBN: | 9783319762944 |
| ISSN: | 1434-4904 |
| On-line přístup: |
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| LEADER | 00000nam a22000005i 4500 | ||
|---|---|---|---|
| 003 | SK-BrCVT | ||
| 005 | 20220618102149.0 | ||
| 007 | cr nn 008mamaa | ||
| 008 | 180320s2018 gw | s |||| 0|eng d | ||
| 020 | |a 9783319762944 | ||
| 024 | 7 | |a 10.1007/978-3-319-76294-4 |2 doi | |
| 035 | |a CVTIDW12645 | ||
| 040 | |a Springer-Nature |b eng |c CVTISR |e AACR2 | ||
| 041 | |a eng | ||
| 100 | 1 | |a Shim, Seongbo. |4 aut | |
| 245 | 1 | 0 | |a Physical Design and Mask Synthesis for Directed Self-Assembly Lithography |h [electronic resource] / |c by Seongbo Shim, Youngsoo Shin. |
| 250 | |a 1st ed. 2018. | ||
| 260 | 1 | |a Cham : |b Springer International Publishing, |c 2018. | |
| 300 | |a XIV, 138 p. 92 illus., 54 illus. in color. |b online resource. | ||
| 490 | 1 | |a NanoScience and Technology, |x 1434-4904 | |
| 500 | |a Chemistry and Materials Science | ||
| 505 | 0 | |a Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL. | |
| 516 | |a text file PDF | ||
| 520 | |a This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology. | ||
| 650 | 0 | |a Nanotechnology. | |
| 650 | 0 | |a Electronic circuits. | |
| 650 | 0 | |a Optical materials. | |
| 650 | 0 | |a Electronic materials. | |
| 650 | 0 | |a Nanoscale science. | |
| 650 | 0 | |a Nanoscience. | |
| 650 | 0 | |a Nanostructures. | |
| 650 | 0 | |a Semiconductors. | |
| 856 | 4 | 0 | |u http://hanproxy.cvtisr.sk/han/cvti-ebook-springer-eisbn-978-3-319-76294-4 |y Vzdialený prístup pre registrovaných používateľov |
| 910 | |b ZE09925 | ||
| 919 | |a 978-3-319-76294-4 | ||
| 974 | |a andrea.lebedova |f Elektronické zdroje | ||
| 992 | |a SUD | ||
| 999 | |c 239317 |d 239317 | ||