Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-asse...

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Hlavný autor: Shim, Seongbo (Autor)
Médium: Elektronický zdroj E-kniha
Jazyk:English
Vydavateľské údaje: Cham : Springer International Publishing, 2018.
Vydanie:1st ed. 2018.
Edícia:NanoScience and Technology,
Predmet:
Nanotechnology.
Electronic circuits.
Optical materials.
Electronic materials.
Nanoscale science.
Nanoscience.
Nanostructures.
Semiconductors.
ISBN:9783319762944
ISSN:1434-4904
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Shrnutí:This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Popis jednotky:Chemistry and Materials Science
Fyzický popis:XIV, 138 p. 92 illus., 54 illus. in color. online resource.
ISBN:9783319762944
ISSN:1434-4904

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