APA (7th ed.) Citation

Atmane, S., Maroussiak, A., Caillard, A., Thomann, A. L., Kateb, M., Gudmundsson, J. T., & Brault, P. (2024). Role of sputtered atom and ion energy distribution in films deposited by physical vapor deposition: A molecular dynamics approach. Journal of Vacuum Science and Technology A, 42(6), . https://doi.org/10.1116/6.0004134

Chicago Style (17th ed.) Citation

Atmane, Soumya, Alexandre Maroussiak, Amaël Caillard, Anne Lise Thomann, Movaffaq Kateb, J. T. Gudmundsson, and Pascal Brault. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A 42, no. 6 (2024). https://doi.org/10.1116/6.0004134.

MLA (9th ed.) Citation

Atmane, Soumya, et al. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A, vol. 42, no. 6, 2024, https://doi.org/10.1116/6.0004134.