Atmane, S., Maroussiak, A., Caillard, A., Thomann, A. L., Kateb, M., Gudmundsson, J. T., & Brault, P. (2024). Role of sputtered atom and ion energy distribution in films deposited by physical vapor deposition: A molecular dynamics approach. Journal of Vacuum Science and Technology A, 42(6), . https://doi.org/10.1116/6.0004134
Citace podle Chicago (17th ed.)Atmane, Soumya, Alexandre Maroussiak, Amaël Caillard, Anne Lise Thomann, Movaffaq Kateb, J. T. Gudmundsson, a Pascal Brault. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A 42, no. 6 (2024). https://doi.org/10.1116/6.0004134.
Citace podle MLA (9th ed.)Atmane, Soumya, et al. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A, vol. 42, no. 6, 2024, https://doi.org/10.1116/6.0004134.