Atmane, S., Maroussiak, A., Caillard, A., Thomann, A. L., Kateb, M., Gudmundsson, J. T., & Brault, P. (2024). Role of sputtered atom and ion energy distribution in films deposited by physical vapor deposition: A molecular dynamics approach. Journal of Vacuum Science and Technology A, 42(6), . https://doi.org/10.1116/6.0004134
Chicago-Zitierstil (17. Ausg.)Atmane, Soumya, Alexandre Maroussiak, Amaël Caillard, Anne Lise Thomann, Movaffaq Kateb, J. T. Gudmundsson, und Pascal Brault. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A 42, no. 6 (2024). https://doi.org/10.1116/6.0004134.
MLA-Zitierstil (9. Ausg.)Atmane, Soumya, et al. "Role of Sputtered Atom and Ion Energy Distribution in Films Deposited by Physical Vapor Deposition: A Molecular Dynamics Approach." Journal of Vacuum Science and Technology A, vol. 42, no. 6, 2024, https://doi.org/10.1116/6.0004134.