Microscopic Analysis of Degradation and Breakdown Kinetics in HfO2 Gate Dielectric after Ions Irradiation - Padovani, Andrea; La Torraca, Paolo; Aguirre, Fernando L.; Ranjan, Alok; Raghavan, Nagarajan; Pey, Kin L.; Palumbo, Felix; Puglisi, Francesco M. (ACS Applied Materials & Interfaces, 2025)