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High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications

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Title: High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
Authors: Michelle Cedillo Rosillo, Oscar Contreras López, Jesús Antonio Díaz, Agustín Conde Gallardo, Harvi A Castillo Cuero
Source: Beilstein J Nanotechnol
Beilstein Journal of Nanotechnology, Vol 16, Iss 1, Pp 690-699 (2025)
Publisher Information: Beilstein Institut, 2025.
Publication Year: 2025
Subject Terms: Technology, epitaxial growth, superconductivity, Chemical technology, Science, Physics, QC1-999, TP1-1185, Full Research Paper, structural evolution, tan thin films, squid
Description: The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films.
Document Type: Article
Other literature type
Language: English
ISSN: 2190-4286
DOI: 10.3762/bjnano.16.53
Access URL: https://doaj.org/article/a0a90d5aa5ca4deaac0bfee83bc017fe
Rights: CC BY
URL: http://creativecommons.org/licenses/by/4.0/This is an open access article licensed under the terms of the Beilstein-Institut Open Access License Agreement (http://www.beilstein-journals.org/bjnano/terms/terms), which is identical to the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0 (http://creativecommons.org/licenses/by/4.0/) ). The reuse of material under this license requires that the author(s), source and license are credited. Third-party material in this article could be subject to other licenses (typically indicated in the credit line), and in this case, users are required to obtain permission from the license holder to reuse the material.
Accession Number: edsair.doi.dedup.....f4d0668cfa9fc9072b6a39f07fcb31d2
Database: OpenAIRE
Description
Abstract:The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films.
ISSN:21904286
DOI:10.3762/bjnano.16.53