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A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent.

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Titel: A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent.
Autoren: Sun, Haifeng, Zhang, Qingyan, Zhou, Jie, Gong, Jianwen, Jin, Chuan, Zhou, Ji, Liu, Junbo
Quelle: Micromachines; Jul2025, Vol. 16 Issue 7, p798, 15p
Schlagwörter: LITHOGRAPHY, OPTIMIZATION algorithms, EMPIRICAL research, MATHEMATICAL optimization, FABRICATION (Manufacturing)
Abstract: Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity. However, due to the low-pass filtering effect of the lithography imaging system, GD, although able to converge quickly, is prone to fall into the local optimum for the information in the corner region of complex patterns. Considering the high-frequency information of the corner region during the optimization process, this paper proposes a resolution layering method to improve the efficiency of GD-based ILT algorithms. A corner-rounding-inspired target retargeting strategy is used to compensate for the over-optimization defect of GD for inversely optimizing the complex pattern layout. Furthermore, for ensuring the manufacturability of masks, differentiable top-hat and bottom-hat operations are employed to improve the optimization efficiency of the proposed method. To confirm the superiority of the proposed method, multiple optimization methods of ILT were compared. Numerical experiments show that the proposed method has higher optimization efficiency and effectively avoids the over-optimization. [ABSTRACT FROM AUTHOR]
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Items – Name: Title
  Label: Title
  Group: Ti
  Data: A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Sun%2C+Haifeng%22">Sun, Haifeng</searchLink><br /><searchLink fieldCode="AR" term="%22Zhang%2C+Qingyan%22">Zhang, Qingyan</searchLink><br /><searchLink fieldCode="AR" term="%22Zhou%2C+Jie%22">Zhou, Jie</searchLink><br /><searchLink fieldCode="AR" term="%22Gong%2C+Jianwen%22">Gong, Jianwen</searchLink><br /><searchLink fieldCode="AR" term="%22Jin%2C+Chuan%22">Jin, Chuan</searchLink><br /><searchLink fieldCode="AR" term="%22Zhou%2C+Ji%22">Zhou, Ji</searchLink><br /><searchLink fieldCode="AR" term="%22Liu%2C+Junbo%22">Liu, Junbo</searchLink>
– Name: TitleSource
  Label: Source
  Group: Src
  Data: Micromachines; Jul2025, Vol. 16 Issue 7, p798, 15p
– Name: Subject
  Label: Subject Terms
  Group: Su
  Data: <searchLink fieldCode="DE" term="%22LITHOGRAPHY%22">LITHOGRAPHY</searchLink><br /><searchLink fieldCode="DE" term="%22OPTIMIZATION+algorithms%22">OPTIMIZATION algorithms</searchLink><br /><searchLink fieldCode="DE" term="%22EMPIRICAL+research%22">EMPIRICAL research</searchLink><br /><searchLink fieldCode="DE" term="%22MATHEMATICAL+optimization%22">MATHEMATICAL optimization</searchLink><br /><searchLink fieldCode="DE" term="%22FABRICATION+%28Manufacturing%29%22">FABRICATION (Manufacturing)</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity. However, due to the low-pass filtering effect of the lithography imaging system, GD, although able to converge quickly, is prone to fall into the local optimum for the information in the corner region of complex patterns. Considering the high-frequency information of the corner region during the optimization process, this paper proposes a resolution layering method to improve the efficiency of GD-based ILT algorithms. A corner-rounding-inspired target retargeting strategy is used to compensate for the over-optimization defect of GD for inversely optimizing the complex pattern layout. Furthermore, for ensuring the manufacturability of masks, differentiable top-hat and bottom-hat operations are employed to improve the optimization efficiency of the proposed method. To confirm the superiority of the proposed method, multiple optimization methods of ILT were compared. Numerical experiments show that the proposed method has higher optimization efficiency and effectively avoids the over-optimization. [ABSTRACT FROM AUTHOR]
– Name: Abstract
  Label:
  Group: Ab
  Data: <i>Copyright of Micromachines is the property of MDPI and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
  BibEntity:
    Identifiers:
      – Type: doi
        Value: 10.3390/mi16070798
    Languages:
      – Code: eng
        Text: English
    PhysicalDescription:
      Pagination:
        PageCount: 15
        StartPage: 798
    Subjects:
      – SubjectFull: LITHOGRAPHY
        Type: general
      – SubjectFull: OPTIMIZATION algorithms
        Type: general
      – SubjectFull: EMPIRICAL research
        Type: general
      – SubjectFull: MATHEMATICAL optimization
        Type: general
      – SubjectFull: FABRICATION (Manufacturing)
        Type: general
    Titles:
      – TitleFull: A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent.
        Type: main
  BibRelationships:
    HasContributorRelationships:
      – PersonEntity:
          Name:
            NameFull: Sun, Haifeng
      – PersonEntity:
          Name:
            NameFull: Zhang, Qingyan
      – PersonEntity:
          Name:
            NameFull: Zhou, Jie
      – PersonEntity:
          Name:
            NameFull: Gong, Jianwen
      – PersonEntity:
          Name:
            NameFull: Jin, Chuan
      – PersonEntity:
          Name:
            NameFull: Zhou, Ji
      – PersonEntity:
          Name:
            NameFull: Liu, Junbo
    IsPartOfRelationships:
      – BibEntity:
          Dates:
            – D: 01
              M: 07
              Text: Jul2025
              Type: published
              Y: 2025
          Identifiers:
            – Type: issn-print
              Value: 2072666X
          Numbering:
            – Type: volume
              Value: 16
            – Type: issue
              Value: 7
          Titles:
            – TitleFull: Micromachines
              Type: main
ResultId 1