APA (7th ed.) Citation

Sun, H., Zhang, Q., Zhou, J., Gong, J., Jin, C., Zhou, J., & Liu, J. (2025). A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent. Micromachines, 16(7), 798-812. https://doi.org/10.3390/mi16070798

Chicago Style (17th ed.) Citation

Sun, Haifeng, Qingyan Zhang, Jie Zhou, Jianwen Gong, Chuan Jin, Ji Zhou, and Junbo Liu. "A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent." Micromachines 16, no. 7 (2025): 798-812. https://doi.org/10.3390/mi16070798.

MLA (9th ed.) Citation

Sun, Haifeng, et al. "A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent." Micromachines, vol. 16, no. 7, 2025, pp. 798-812, https://doi.org/10.3390/mi16070798.