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Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography.

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Názov: Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography.
Autori: Hasuike, Noriyuki, Maeda, Takeshi, Takeda, Minoru
Zdroj: Optical Review; Oct2022, Vol. 29 Issue 5, p450-455, 6p
Predmety: NANOIMPRINT lithography, DIFFRACTION gratings, SURFACE plasmon resonance, THIN films, PLASMONICS, ION bombardment, FOCUSED ion beams
Abstrakt: Indium tin oxide (ITO) diffraction grating was fabricated on a polyimide (PI) film by using a combination of thermal nanoimprint lithography (NIL) process and radio frequency (RF) sputtering method. The thermal NIL process was used to transfer a line and space pattern to the PI film and then an ITO thin film with a thickness of several hundred nanometers was deposited on the patterned PI film. A polarized reflection spectrum showed a characteristic decrease in reflectance due to surface plasmon resonance in an infrared spectral region, which is similar to that of the grating fabricated directly on ITO film using focused ion beam lithography. The fabrication process proposed in this study can easily realize an ITO grating structure with a large area. [ABSTRACT FROM AUTHOR]
Copyright of Optical Review is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract. (Copyright applies to all Abstracts.)
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  Label: Title
  Group: Ti
  Data: Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography.
– Name: Author
  Label: Authors
  Group: Au
  Data: <searchLink fieldCode="AR" term="%22Hasuike%2C+Noriyuki%22">Hasuike, Noriyuki</searchLink><br /><searchLink fieldCode="AR" term="%22Maeda%2C+Takeshi%22">Maeda, Takeshi</searchLink><br /><searchLink fieldCode="AR" term="%22Takeda%2C+Minoru%22">Takeda, Minoru</searchLink>
– Name: TitleSource
  Label: Source
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  Data: Optical Review; Oct2022, Vol. 29 Issue 5, p450-455, 6p
– Name: Subject
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  Group: Su
  Data: <searchLink fieldCode="DE" term="%22NANOIMPRINT+lithography%22">NANOIMPRINT lithography</searchLink><br /><searchLink fieldCode="DE" term="%22DIFFRACTION+gratings%22">DIFFRACTION gratings</searchLink><br /><searchLink fieldCode="DE" term="%22SURFACE+plasmon+resonance%22">SURFACE plasmon resonance</searchLink><br /><searchLink fieldCode="DE" term="%22THIN+films%22">THIN films</searchLink><br /><searchLink fieldCode="DE" term="%22PLASMONICS%22">PLASMONICS</searchLink><br /><searchLink fieldCode="DE" term="%22ION+bombardment%22">ION bombardment</searchLink><br /><searchLink fieldCode="DE" term="%22FOCUSED+ion+beams%22">FOCUSED ion beams</searchLink>
– Name: Abstract
  Label: Abstract
  Group: Ab
  Data: Indium tin oxide (ITO) diffraction grating was fabricated on a polyimide (PI) film by using a combination of thermal nanoimprint lithography (NIL) process and radio frequency (RF) sputtering method. The thermal NIL process was used to transfer a line and space pattern to the PI film and then an ITO thin film with a thickness of several hundred nanometers was deposited on the patterned PI film. A polarized reflection spectrum showed a characteristic decrease in reflectance due to surface plasmon resonance in an infrared spectral region, which is similar to that of the grating fabricated directly on ITO film using focused ion beam lithography. The fabrication process proposed in this study can easily realize an ITO grating structure with a large area. [ABSTRACT FROM AUTHOR]
– Name: Abstract
  Label:
  Group: Ab
  Data: <i>Copyright of Optical Review is the property of Springer Nature and its content may not be copied or emailed to multiple sites without the copyright holder's express written permission. Additionally, content may not be used with any artificial intelligence tools or machine learning technologies. However, users may print, download, or email articles for individual use. This abstract may be abridged. No warranty is given about the accuracy of the copy. Users should refer to the original published version of the material for the full abstract.</i> (Copyright applies to all Abstracts.)
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RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1007/s10043-022-00759-8
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 450
    Subjects:
      – SubjectFull: NANOIMPRINT lithography
        Type: general
      – SubjectFull: DIFFRACTION gratings
        Type: general
      – SubjectFull: SURFACE plasmon resonance
        Type: general
      – SubjectFull: THIN films
        Type: general
      – SubjectFull: PLASMONICS
        Type: general
      – SubjectFull: ION bombardment
        Type: general
      – SubjectFull: FOCUSED ion beams
        Type: general
    Titles:
      – TitleFull: Fabrication of ITO diffraction grating structure for infrared plasmonics by thermal nanoimprint lithography.
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            NameFull: Hasuike, Noriyuki
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            NameFull: Maeda, Takeshi
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            – D: 01
              M: 10
              Text: Oct2022
              Type: published
              Y: 2022
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