Diffraction by random Ronchi gratings.
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| Název: | Diffraction by random Ronchi gratings. |
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| Autoři: | Torcal-Milla FJ, Sanchez-Brea LM |
| Zdroj: | Applied optics [Appl Opt] 2016 Aug 01; Vol. 55 (22), pp. 5855-9. |
| Způsob vydávání: | Journal Article |
| Jazyk: | English |
| Informace o časopise: | Publisher: Optica Publishing Group Country of Publication: United States NLM ID: 0247660 Publication Model: Print Cited Medium: Internet ISSN: 1539-4522 (Electronic) Linking ISSN: 1559128X NLM ISO Abbreviation: Appl Opt Subsets: PubMed not MEDLINE |
| Imprint Name(s): | Publication: Washington, DC : Optica Publishing Group Original Publication: Easton, Pa., Optical Society of America. |
| Abstrakt: | In this work, we obtain analytical expressions for the near-and far-field diffraction of random Ronchi diffraction gratings where the slits of the grating are randomly displaced around their periodical positions. We theoretically show that the effect of randomness in the position of the slits of the grating produces a decrease of the contrast and even disappearance of the self-images for high randomness level at the near field. On the other hand, it cancels high-order harmonics in far field, resulting in only a few central diffraction orders. Numerical simulations by means of the Rayleigh-Sommerfeld diffraction formula are performed in order to corroborate the analytical results. These results are of interest for industrial and technological applications where manufacture errors need to be considered. |
| Entry Date(s): | Date Created: 20160810 Date Completed: 20180129 Latest Revision: 20181023 |
| Update Code: | 20250114 |
| DOI: | 10.1364/AO.55.005855 |
| PMID: | 27505363 |
| Databáze: | MEDLINE |
| Abstrakt: | In this work, we obtain analytical expressions for the near-and far-field diffraction of random Ronchi diffraction gratings where the slits of the grating are randomly displaced around their periodical positions. We theoretically show that the effect of randomness in the position of the slits of the grating produces a decrease of the contrast and even disappearance of the self-images for high randomness level at the near field. On the other hand, it cancels high-order harmonics in far field, resulting in only a few central diffraction orders. Numerical simulations by means of the Rayleigh-Sommerfeld diffraction formula are performed in order to corroborate the analytical results. These results are of interest for industrial and technological applications where manufacture errors need to be considered. |
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| ISSN: | 1539-4522 |
| DOI: | 10.1364/AO.55.005855 |
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