Výsledky vyhledávání - "etching process control algorithm"

Automatic speed control system for the chemical etching of thin films

Autoři: A.V. Dalekorej V.P. Ivanytsky A.A. Kryuchyn a další

Zdroj: Фізика і хімія твердого тіла, Vol 26, Iss 1, Pp 91-99 (2025)

Témata: automation of chemical etching processes, automatic control system, interference thickness control methods, etching process control algorithm, Physics, QC1-999

Popis souboru: electronic resource

Relation: https://journals.pnu.edu.ua/index.php/pcss/article/view/8778; https://doaj.org/toc/1729-4428; https://doaj.org/toc/2309-8589

Přístupová URL adresa: https://doaj.org/article/11ebda1d7b854bdaa3801d6349877357

Automatic speed control system for the chemical etching of thin films.

Alternate Title: Система автоматичного контролю швидкості хімічного травлення тонких плівок. (Ukrainian)

Autoři: Dalekorej, A. V. Ivanytsky, V. P. Kryuchyn, A. A. a další

Zdroj: Physics & Chemistry of Solid State; 2025, Vol. 26 Issue 1, p91-99, 9p

Témata: AUTOMATIC control systems, PROCESS control systems, CHEMICAL processes, CHEMICAL systems, OPTICAL fibers

Machine learning aided process control: critical dimension uniformity control of etching process in 1z nm DRAM.

Autoři: Adan, Ofer Robinson, John C. Jo, Taeyong a další

Zdroj: Proceedings of SPIE; 11/4/2020, Vol. 11611, p116111L-116111L-6, 1p