Výsledky vyhľadávania - "chloride-based chemical vapor deposition"

Influence of Different Hydrocarbons on Chemical Vapor Deposition Growth and Surface Morphological Defects in 4H‐SiC Epitaxial Layers

Autori: Ghezellou, Misagh ul-Hassan, Jawad

Zdroj: Physica Status Solidi (B). 261(4)

Predmety: 4H-SiC, chloride-based chemical vapor deposition, epitaxial growth, inclined line-like defects, short step bunching

Popis súboru: electronic

Prístupová URL adresa: https://urn.kb.se/resolve?urn=urn:nbn:se:liu:diva-200853
https://doi.org/10.1002/pssb.202300535