Suchergebnisse - "THIN film deposition"

Hybrid plasma model for reactive deposition of CrN thin films by deep oscillation magnetron sputtering.

Autoren: Gao, J. Y. Ferreira, F. Lei, M. K.

Quelle: Journal of Applied Physics. 6/28/2025, Vol. 137 Issue 24, p1-20. 20p.

Schlagwörter: *THIN film deposition, *REACTIVE sputtering, *SPUTTER deposition, *MAGNETRON sputtering, *CHEMICAL reactions

Flatbands of spin waves in two-dimensional magnonic crystals with kagome lattices.

Autoren: Yang, Hui Yun, Guohong Cao, Yongjun

Quelle: Journal of Applied Physics. 3/21/2025, Vol. 137 Issue 11, p1-8. 8p.

Schlagwörter: *THIN film deposition, *CONDENSED matter, *CRYSTAL lattices, *FERROMAGNETIC materials, *CRYSTALS

Influence of Hf- and multi-rare earth introduction on the photo-transport properties of ZnO thin films deposited on Si by magnetron sputtering and post-annealed.

Autoren: Nadtochiy, A. Podolian, A. Korotchenkov, O. et al.

Quelle: Journal of Applied Physics; 11/28/2025, Vol. 138 Issue 20, p1-15, 15p

Schlagwörter: RARE earth metals, ZINC oxide thin films, THIN film deposition, MAGNETRON sputtering, SILICON

Role of voltage-controlled magnetic anisotropy in the recent development of magnonics and spintronics.

Autoren: Rana, Bivas¹ (AUTHOR) bivran@amu.edu.pl

Quelle: Journal of Applied Physics. 10/21/2024, Vol. 136 Issue 15, p1-26. 26p.

Schlagwörter: *THIN film deposition, *MAGNETIC anisotropy, *MAGNETIZATION reversal, *MAGNETIC materials, *MAGNETIC films

Selected high-entropy alloys for thin film deposition, with improved mechanical and corrosion properties.

Autoren: Mitrica, Dumitru Mosinoiu, Laurentiu-Florin Sobetkii, Arcadii et al.

Quelle: Scientific Reports. 10/28/2025, Vol. 15 Issue 1, p1-13. 13p.

Schlagwörter: *HIGH-entropy alloys, *THIN film deposition, *MECHANICAL behavior of materials, *SURFACE coatings, *ELECTROCHEMICAL analysis, *MAGNETRON sputtering, *CORROSION resistance

High‐Rate FA‐Based Co‐Evaporated Perovskites: Understanding Rate Limitations and Practical Considerations to Overcome Their Impact.

Autoren: Feeney, Thomas Miaskiewicz, Aleksandra Petry, Julian et al.

Quelle: Advanced Functional Materials. Oct2025, p1. 14p. 7 Illustrations.

Schlagwörter: *SOLAR cells, *THIN film deposition, *SUBLIMATION (Chemistry), *PROCESS optimization, *ENERGY conversion, *FABRICATION (Manufacturing), *VAPORIZATION

Electrochemistry-induced deposition for controlled formation of metal–organic framework films on insulator and conductor substrates.

Autoren: Ito, Takashi Skinner, Elise A.

Quelle: CrystEngComm. 10/14/2025, Vol. 27 Issue 38, p6274-6282. 9p.

Schlagwörter: *METAL-organic frameworks, *THIN film deposition, *SUBSTRATES (Materials science), *THIN films, *ELECTROCHEMISTRY, *FABRICATION (Manufacturing), *THICKNESS measurement

Effect of lanthanum oxide modification on the structure, microstructure, and properties of Sr0.5Ba0.5Nb2O6.

Autoren: Makinyan, Norayr V. Zabolotnyi, Anton A. Matyash, Yana Yu et al.

Quelle: Ceramics International. Oct2025:Part B, Vol. 51 Issue 25, p45400-45409. 10p.

Schlagwörter: *THIN film deposition, *OPTICAL constants, *SPUTTER deposition, *LANTHANUM oxide, *DIELECTRIC properties

Study on the similarity laws for capacitively coupled radio frequency discharges across pressure and dimension scales.

Autoren: Zhang, Wenjin Yang, Dong Fu, Yangyang

Quelle: Journal of Applied Physics; 9/14/2025, Vol. 138 Issue 10, p1-11, 11p

Schlagwörter: RADIO frequency discharges, PLASMA sources, THIN film deposition, SEMICONDUCTOR industry, ELECTRON density

Numerical investigation of plasma properties in Ar/SiH4 inductively coupled plasmas considering electron energy distribution functions.

Autoren: Kim, Ji-Hoon Yoon, Min-Young Kim, Gwan et al.

Quelle: Journal of Applied Physics. 9/7/2024, Vol. 136 Issue 9, p1-16. 16p.

Schlagwörter: *THIN film deposition, *BOLTZMANN'S equation, *ELECTRON distribution, *ENERGY function, *AMORPHOUS silicon, *PLASMA flow

Stability Improvement of Power MOSFET-Driven Plasma Generation Device for Thin Film Deposition and Chamber Cleaning.

Autoren: Pan, Xiaogang Liu, Kangli Zhao, Jianfeng et al.

Quelle: IEEE Transactions on Semiconductor Manufacturing. May2025, Vol. 38 Issue 2, p352-355. 4p.

Schlagwörter: *SEMICONDUCTOR manufacturing, THIN film deposition, METAL oxide semiconductor field-effect transistors, PLASMA production, DYNAMIC stability, DYNAMIC loads, CURRENT-voltage characteristics

Effect of Substrate Temperature on the Growth of InAs/Graphene Films.

Autoren: Agrawal, Arpana¹ (AUTHOR) dr.arpanaagrawal@mp.gov.in

Quelle: Physica Status Solidi (B). Sep2025, p1. 9p. 8 Illustrations.

Schlagwörter: *THIN film deposition, *SURFACE temperature, *HEAT transfer, *THIN films, *MOLECULAR beam epitaxy, *EPITAXY, *ADSORPTION kinetics

Particle-free thin film deposition from acetylene and silane precursors using atmospheric plasma vacuum ultraviolet radiation.

Autoren: Winzer, T Reiser, C Benedikt, J

Quelle: Journal of Physics D: Applied Physics. 7/7/2025, Vol. 58 Issue 27, p1-19. 19p.

Schlagwörter: *THIN film deposition, *ATMOSPHERIC radiation, *HELIUM plasmas, *ELECTRON affinity, *INFRARED spectroscopy

Investigation of a Hybrid Discharge Mode of a Pin‐to‐Plate DBD in Ar‐Hexamethyldisilane and Its Influence on Thin Film Deposition.

Autoren: Bröcker, Lars Klages, Claus‐Peter Becker, Markus M. et al.

Quelle: Plasma Processes & Polymers. Jul2025, Vol. 22 Issue 7, p1-7. 7p.

Schlagwörter: *THIN film deposition, *PLASMA deposition, *ATMOSPHERIC pressure plasmas, *ATMOSPHERIC pressure, *ARGON, *NON-thermal plasmas, *ORGANOSILICON compounds, *PLASMA flow

Effect of radio frequency bias on the ion extraction from high-density electropositive plasmas.

Autoren: Levko, Dmitry

Quelle: Journal of Applied Physics; 5/7/2025, Vol. 137 Issue 17, p1-8, 8p

Schlagwörter: RADIO frequency, MATERIALS science, THIN film deposition, ELECTRIC propulsion, PLASMA production, ION energy

Low temperature sputtering deposition of Al1−xScxN thin films: Physical, chemical, and piezoelectric properties evolution by tuning the nitrogen flux in (Ar + N2) reactive atmosphere.

Autoren: Signore, M. A. Serra, A. Manno, D. et al.

Quelle: Journal of Applied Physics. 3/28/2024, Vol. 135 Issue 12, p1-11. 11p.

Schlagwörter: *PIEZOELECTRIC thin films, *THIN film deposition, *SPUTTER deposition, *LOW temperatures, *KELVIN probe force microscopy, *RUTHERFORD backscattering spectrometry, *ATMOSPHERIC nitrogen

A hybrid plasma model for Cr thin film deposition by deep oscillation magnetron sputtering.

Autoren: Gao, J. Y. Ferreira, F. Lei, M. K.

Quelle: Journal of Applied Physics. 1/21/2024, Vol. 135 Issue 3, p1-14. 14p.

Schlagwörter: *THIN film deposition, *PLASMA chemistry, *MAGNETRON sputtering, *KINETIC energy, *PLASMA diffusion, *TWO-dimensional models

Round and pleated blisters: interface delamination in thin film deposition.

Autoren: Wang, Wenxiang Chen, Shengyao Cao, Jiacong et al.

Quelle: International Journal of Smart & Nano Materials. Jun2025, Vol. 16 Issue 2, p343-358. 16p.

Schlagwörter: *ELECTRON beam deposition, *THIN film deposition, *SUBSTRATES (Materials science), *THIN films, *ELEMENTAL analysis

Oxide Membranes from Bulk Micro‐Machining of SrTiO3 Substrates.

Autoren: Manca, Nicola Plaza, Alejandro E. Cichetto, Leonélio et al.

Quelle: Advanced Science. 5/29/2025, Vol. 12 Issue 20, p1-8. 8p.

Schlagwörter: *THIN film devices, *THIN film deposition, *SUBSTRATES (Materials science), *OXIDE coating, *SILICON compounds

Optical bandgap engineering and urbach energy in Ni-doped CdSe nanostructured thin films.

Autoren: Siahkali, Zahra Ghobadi, Nader Mehrparvar, Dariush

Quelle: International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics. 5/20/2025, Vol. 39 Issue 13, p1-16. 16p.

Schlagwörter: *CHEMICAL solution deposition, *THIN film deposition, *BAND gaps, *THIN films, *ABSORPTION spectra