Suchergebnisse - "Marko Vehkamäki"

Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide FilmsThe authors are grateful to Mr. Marko Vehkamäki for the EDX analysis results. The study has been supported by the Academy of Finland (Projects Nos. 51989, 43329).

Autoren: K. Kukli M. Ritala V. Pore et al.

Quelle: Chemical Vapor Deposition; Mar2006, Vol. 12 Issue 2/3, p158-164, 7p

Toward epitaxial ternary oxide multilayer device stacks by atomic layer deposition

Autoren: Peter J. King Marko Vehkamäki Miika Mattinen et al.

Weitere Verfasser: Peter J. King Marko Vehkamäki Miika Mattinen et al.

Quelle: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 37

Schlagwörter: Physical sciences, 0301 basic medicine, 0303 health sciences, 03 medical and health sciences, SRTIO3, GROWTH, LANIO3 THIN-FILMS, Nano-technology

Dateibeschreibung: application/pdf

Zugangs-URL: https://helda.helsinki.fi/bitstream/10138/308872/1/King2019_JVSTA_multilayer_1.pdf
https://avs.scitation.org/doi/10.1116/1.5081997
https://ui.adsabs.harvard.edu/abs/2019JVSTA..37b0602K/abstract
https://avs.scitation.org/doi/abs/10.1116/1.5081997%40jva.2019.OXID18.issue-1
https://researchportal.helsinki.fi/en/publications/toward-epitaxial-ternary-oxide-multilayer-device-stacks-by-atomic
http://hdl.handle.net/10138/308872

Molecular layer deposition of hybrid silphenylene-based dielectric film.

Autoren: Li, Xinzhi Vehkamäki, Marko Chundak, Mykhailo et al.

Quelle: Advanced Composites & Hybrid Materials; Oct2023, Vol. 6 Issue 5, p1-11, 11p

Toward epitaxial ternary oxide multilayer device stacks by atomic layer deposition.

Autoren: King, Peter J. Vehkamäki, Marko Mattinen, Miika et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2019, Vol. 37 Issue 2, pN.PAG-N.PAG, 4p

Schlagwörter: TERNARY alloys, ATOMIC layer deposition, PEROVSKITE, HEAT treatment of metals, ANNEALING of metals, ELECTRIC insulators & insulation

Contents list.

Quelle: Dalton Transactions: An International Journal of Inorganic Chemistry; 7/28/2023, Vol. 52 Issue 28, p9515-9524, 10p

Schlagwörter: INTERNET protocols, BANKING industry

Atomic Layer Deposition of Boron‐Doped Al2O3 Dielectric Films.

Autoren: Li, Xinzhi Vehkamäki, Marko Chundak, Mykhailo et al.

Quelle: Advanced Materials Interfaces; 6/27/2023, Vol. 10 Issue 18, p1-8, 8p

Schlagwörter: ATOMIC layer deposition, DOPING agents (Chemistry), ATTENUATED total reflectance, FIELD emission electron microscopy, FOURIER transform infrared spectroscopy, DIELECTRIC films, BORON

Molecular Layer Deposition of Pyrrone Thin Films by Oxidative Polymerization.

Autoren: Ghafourisaleh, Saba Vehkamäki, Marko Vihervaara, Anton et al.

Quelle: Advanced Materials Interfaces; 3/6/2023, Vol. 10 Issue 7, p1-10, 10p

Schlagwörter: THIN film deposition, FOURIER transform infrared spectroscopy, POLYMERIZATION, ATOMIC force microscopy, SCANNING electron microscopy, THIN films

In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes.

Autoren: Nieminen, Heta-Elisa Chundak, Mykhailo Heikkilä, Mikko J. et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2023, Vol. 41 Issue 2, p1-11, 11p

Schlagwörter: ATOMIC layer deposition, NUCLEAR reactions, ETCHING, SURFACE analysis, SURFACE reactions

Studies on solid state reactions of atomic layer deposited thin films of lithium carbonate with hafnia and zirconia.

Autoren: Mäntymäki, Miia Atosuo, Elisa Heikkilä, Mikko J. et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2019, Vol. 37 Issue 2, pN.PAG-N.PAG, 8p

Schlagwörter: LITHIUM carbonate, HAFNIUM oxide, ZIRCONIUM oxide, METALLIC thin films, ATOMIC layer deposition, SOLID state physics

Molecular Layer Deposition of Thermally Stable Polybenzimidazole‐Like Thin Films and Nanostructures.

Autoren: Ghafourisaleh, Saba Hatanpää, Timo Vihervaara, Anton et al.

Quelle: Advanced Materials Interfaces; 5/23/2022, Vol. 9 Issue 15, p1-12, 12p

Schlagwörter: FOURIER transform infrared spectroscopy, MONOMOLECULAR films, ATOMIC force microscopy, NANOSTRUCTURES, SCANNING electron microscopy

Atomic layer deposition of GdF3 thin films.

Autoren: Atosuo, Elisa Mizohata, Kenichiro Mattinen, Miika et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2022, Vol. 40 Issue 2, p1-8, 8p

Schlagwörter: ATOMIC layer deposition, THIN film deposition, ANTIREFLECTIVE coatings, THIN films, OPTICAL materials, DIELECTRIC films, DIELECTRIC properties

Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors.

Autoren: Miikkulainen, Ville Väyrynen, Katja Mizohata, Kenichiro et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Nov/Dec2019, Vol. 37 Issue 6, pN.PAG-N.PAG, 9p

Schlagwörter: ATOMIC layer deposition, TANTALUM compounds, TANTALUM, LIGHT sources, ALKOXIDES, TANTALUM oxide, SURFACE reactions

Inherent area-selective atomic layer deposition of ZnS.

Autoren: Zhang, Chao Vehkamäki, Marko Leskelä, Markku et al.

Quelle: Dalton Transactions: An International Journal of Inorganic Chemistry; 7/28/2023, Vol. 52 Issue 28, p9622-9630, 9p

Schlagwörter: ATOMIC layer deposition, SURFACE passivation

Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2−n thin films.

Autoren: Popov, Georgi Bačić, Goran Van Dijck, Charlotte et al.

Quelle: Dalton Transactions: An International Journal of Inorganic Chemistry; 10/21/2022, Vol. 51 Issue 39, p15142-15157, 16p

Schlagwörter: ATOMIC layer deposition, LEAD halides, THIN films, CESIUM compounds, PEROVSKITE, SOLAR cells

Contents list.

Quelle: Green Chemistry; 10/7/2017, Vol. 19 Issue 19, p4461-4468, 8p

Schlagwörter: IONIC liquids, BENZYLIC group, ALCOHOLS (Chemical class)

Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Deposition: First Steps for Integrated Electric Circuitry.

Autoren: Nyman, Leo Kestilä, Antti Porri, Paavo et al.

Quelle: Journal of Aerospace Engineering; Sep2021, Vol. 34 Issue 5, p1-12, 12p

Schlagwörter: ATOMIC layer deposition, POLYETHER ether ketone, POLYMER degradation, POLYCARBONATES, OXYGEN, ACRYLONITRILE butadiene styrene resins, ULTRAVIOLET radiation, ANTILOCK brake systems in automobiles

Highly Material Selective and Self‐Aligned Photo‐assisted Atomic Layer Deposition of Copper on Oxide Materials.

Autoren: Miikkulainen, Ville Vehkamäki, Marko Mizohata, Kenichiro et al.

Quelle: Advanced Materials Interfaces; 6/9/2021, Vol. 8 Issue 11, p1-9, 9p

Schlagwörter: ATOMIC layer deposition, COPPER oxide, COPPER films, SILICON oxide, ALUMINUM oxide, TANTALUM compounds, TANTALATES

Metal oxide multilayer hard mask system for 3D nanofabrication.

Autoren: Zhongmei Han Emma Salmi Marko Vehkamäki et al.

Quelle: Nanotechnology; 2/2/2018, Vol. 29 Issue 5, p1-1, 1p

Schlagwörter: METALLIC oxides, NANOFABRICATION, ATOMIC layer deposition

Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3 for atomic layer deposition of ZrO2.

Autoren: Seppälä, Sanni Vehkamäki, Marko Mizohata, Kenichiro et al.

Quelle: Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; Mar2019, Vol. 37 Issue 2, pN.PAG-N.PAG, 8p

Schlagwörter: ZIRCONIUM oxide, HETEROLEPTIC compounds, CHEMICAL precursors, ATOMIC layer deposition, OZONE

Atomic Layer Deposition of Rhenium Disulfide.

Autoren: Hämäläinen, Jani Mattinen, Miika Mizohata, Kenichiro et al.

Quelle: Advanced Materials; 6/22/2018, Vol. 30 Issue 24, p1-1, 6p