Search Results - "Gas phase etching"
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1
Authors: et al.
Contributors: et al.
Source: Journal of Materials Chemistry C. 13:2347-2355
Subject Terms: Etching, Chemical sciences, Gas phase etching, Al3O2, 0103 physical sciences, Mechanisms, Ta2o5, ZrO2, isotropic etching, 02 engineering and technology, 0210 nano-technology, 01 natural sciences, Films
File Description: application/pdf
Access URL: http://hdl.handle.net/10138/589493
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2
Authors: et al.
Contributors: et al.
Subject Terms: Gas phase etching, Ta2o5, Mechanisms, Etching, Al3O2, Films, ZrO2, isotropic etching, Chemical sciences
File Description: application/pdf
Relation: Ojala , J , Vehkamaeki , M , Chundak , M , Vihervaara , A , Mizohata , K & Ritala , M 2024 , ' Selective gas phase pulsed etching of oxides with NbCl 5 ' , Journal of Materials Chemistry C . https://doi.org/10.1039/d4tc03488k; http://hdl.handle.net/10138/589493; 85211637422; 001372070600001
Availability: http://hdl.handle.net/10138/589493
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3
Authors: et al.
Source: Photonic Sensors
Subject Terms: ddc:620, Doping, Gas phase etching, Metal coating, Nanoprobes, Optical fiber tips, Tip shaping, All fiber, Annealing treatments, Boron-doped, Dopant concentrations, Etching gas, Etching rate, Fiber tip, Imaging applications, Nanoscaled, New applications, Sensor applications, Sensor designs, Silica fibers, Silica-based fibers, Silver layer, Step-index fibers, Surface plasmons, Technical implementation, Tip radius, Vapour deposition, Doping (additives), Etching, Fluorine
File Description: application/pdf
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4
Authors: et al.
Source: Angewandte Chemie (International ed. in English) [Angew Chem Int Ed Engl] 2024 Jul 01; Vol. 63 (27), pp. e202403508. Date of Electronic Publication: 2024 May 27.
Publication Type: Journal Article
Journal Info: Publisher: Wiley-VCH Country of Publication: Germany NLM ID: 0370543 Publication Model: Print-Electronic Cited Medium: Internet ISSN: 1521-3773 (Electronic) Linking ISSN: 14337851 NLM ISO Abbreviation: Angew Chem Int Ed Engl Subsets: PubMed not MEDLINE; MEDLINE
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